Temperature dependent pulsed and ramped substrate bias measurements are used to develop a detailed understanding of the vertical carrier transport in the buffer layers in a carbon doped GaN power heterojunction field effect transistor. Carbon doped GaN and multiple layers of AlGaN alloy are used in these devices to deliver an insulating and strain relieved buffer with high breakdown voltage capability. However, understanding of the detailed physical mechanism for its operation is still lacking. At the lowest electric fields (< 10MV/m), charge redistribution within the C doped layer is shown to occur by hole conduction in the valence band with activation energy 0.86eV. At higher fields, leakage between the two-dimensional electron gas and the buffer dominates occurring by a Poole-Frenkel mechanism with activation energy ~0.65eV, presumably along threading dislocations.At higher fields still, the strain relief buffer starts to conduct by a field dependent process. Balancing the onset of these leakage mechanisms is essential to allow the build-up of positive rather than negative space charge, and thus minimize bulk-related current-collapse in these devices.
The role of buffer traps (identified as C N acceptors through current DLTS) in the off-state leakage and dynamic Ron of 650V rated GaN-on-Si power devices is investigated. The dynamic Ron is strongly voltage-dependent, due to the interplay between the dynamic properties of the C N traps and the presence of space-charge limited current components. This results in a complete suppression of dyn Ron degradation under HTRB conditions between 420V and 850V.
Charge movement in a GaN-based hetero-structure field effect transistor structure with carbon doped buffer under applied substrate bias. Journal of Applied Physics, 118(21), [215701]. DOI: 10.1063/1.4936780Publisher's PDF, also known as Version of record
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General rightsThis document is made available in accordance with publisher policies. Please cite only the published version using the reference above. Full terms of use are available: http://www.bristol.ac.uk/pure/about/ebr-terms Charge movement in a GaN-based hetero-structure field effect transistor structure with carbon doped buffer under applied substrate bias Charge trapping and transport in the carbon doped GaN buffer of a GaN-based hetero-structure field effect transistor (HFET) has been investigated under both positive and negative substrate bias. Clear evidence of redistribution of charges in the carbon doped region by thermally generated holes is seen, with electron injection and capture observed during positive bias. Excellent agreement is found with simulations. It is shown that these effects are intrinsic to the carbon doped GaN and need to be controlled to provide reliable and efficient GaN-based power HFETs.
We report on electroluminescence (EL) emission from AlGaN/GaN high electron mobility transistors (HEMTs). Intensity maxima at the drain-side edge of the gate foot and at the drain-side edge of the gate field plate are observed. To relate the EL intensity profile to the electric field along the channel, 2D device simulations have been performed at different drain biases. The dependences of both EL maxima on the electric field reveal a threshold which closely correlates with the electric field strength at which a transfer of conduction band electrons from the zone centre minimum to satellite valleys sets in. We further analyze the dependence of the EL spectra on the drain voltage. The obtained results strongly suggest that the EL emission observed in AlGaN/GaN HEMTs is dominated by radiative inter-valley electron transitions.
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