We present the light-on results of our 65-inch

AMOLED displays based on metal oxide film as active channel layer are fabricated. To achieve cost‐competitive process in OLED manufacturing, solution‐processed HIL, HTL and pixilated EML (RGB) layers followed by evaporation process for other layers are demonstrated in this work. Meanwhile, the AMOLED backplanes possessing low power consumption and high frequency were fabricated on metal oxide TFTs with high mobility (23.13 cm2/Vs) technology. A 14” qHD AMOLED in 79 ppi‐resolution was realized with IGZO based active matrix panel.

We reported amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) TFT OLED TV panel development in AUO. The Generation 6 (G6) threshold voltage uniformity can be lower than 0.8V. The RGB side-by-side OLED patterning was realized by fine metal mask. By the application of a source follower connection pixel compensation circuit, the panels driven by AUO engine show excellent characteristics. For future product performance requirement, amorphous Indium-Tin-Zinc-Oxide (a-ITZO) TFT was developing, high mobility as 33.2 cm2/Vs was achieved. Metal-organic chemical vapor deposition (MOCVD) system was also used to improve the mobility of IGZO TFT. To improve manufacturing efficiency of OLED process, inkjet printing technology is also under development in AUO.

We

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