Surface polarization promotes the charge separation efficiency of PCN/PANI/BTO ternary heterojunction, resulting in an enhanced visible-light photocatalytic hydrogen production activity.
The strain effect on the electronic properties of bilayer tungsten disulfide (WS2) is investigated by density functional theory (DFT). It is found that the band gap and carrier effective masses of AA and AB stacking bilayer WS2 decrease with increasing tensile strain. However, their band gap first increases under small compressive strain and then decreases with large compressive strain applied. These results can be explained by the interplay between the projected density of states contributed by the p-orbital of sulfur (S) atoms and those contributed by the d-orbital of tungsten (W) atoms. To measure this interaction quantitatively, a parameter N is proposed in our work. This work could serve as a guideline for the future manipulation of the electronic properties of WS2.
In this paper, we investigate the performance of the bulk fin field effect transistor (FinFET) through a threedimensional (3D) full band Monte Carlo simulator with quantum correction. Several scattering mechanisms, such as the acoustic and optical phonon scattering, the ionized impurity scattering, the impact ionization scattering and the surface roughness scattering are considered in our simulator. The effects of the substrate bias and the surface roughness scattering near the Si/SiO 2 interface on the performance of bulk FinFET are mainly discussed in our work. Our results show that the on-current of bulk FinFET is sensitive to the surface roughness and that we can reduce the substrate leakage current by modulating the substrate bias voltage.
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