Analog layout synthesis requires some elements in the circuit netlist to be matched and placed symmetrically. However, the set of symmetries is very circuit-specific and a versatile algorithm, applicable to a broad variety of circuits, has been elusive. This paper presents a general methodology for the automated generation of symmetry constraints, and applies these constraints to guide automated layout synthesis. While prior approaches were restricted to identifying simple symmetries, the proposed method operates hierarchically and uses graph-based algorithms to extract multiple axes of symmetry within a circuit. An important ingredient of the algorithm is its ability to identify arrays of repeated structures. In some circuits, the repeated structures are not perfect replicas and can only be found through approximate graph matching. A fast graph neural network based methodology is developed for this purpose, based on evaluating the graph edit distance. The utility of this algorithm is demonstrated on a variety of circuits, including operational amplifiers, data converters, equalizers, and low-noise amplifiers.
Well island generation and well tap placement is an important problem in analog/mixed-signal (AMS) circuits. Well taps can only prevent latchups within a certain radius of influence within a well island, and hence must be appropriately inserted to cover all devices. However, existing automated AMS layout paradigms typically defer the insertion of well taps and creation of well islands to a post-processing step after placement. This alters the placement, resulting in increased area and wire length, as well as circuit performance degradation. Therefore, there is a strong need for a solution that generates well islands and inserts well taps
during placement
so that the placer can account for well overheads in optimizing placement metrics. In this work, we propose a modular solution using a graph-based optimization scheme that can be used within multiple placement paradigms with minimal intrusion. We demonstrate the integration of this scheme into stochastic, analytical and designer-driven row-based placement. The method is demonstrated in advanced FinFET technologies. Layouts generated using this scheme show better area, wire length, and performance metrics at the cost of a marginal runtime degradation when compared to the post-processing approach. Using our scheme, there is an average improvement of 3% and 4% and a maximum improvement of 23% and 11% in area and wirelength respectively of layouts of various classes of AMS circuits at the cost of 17% average and 29% maximum increase in total runtime.
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