ilfusashino-shi, mKyO 1g0 *NTT LSI laboratories, Atsugi-shi, KNAGAI{A 248_01 Initial oxidation processes of clean Si(100) surfaces oxidized by super-pure and normal grade oxygen gases are analyzed by synehrotron radiation photoemission spectroscopy to investigate the effect of He0 impurities. A significant difference in initial oxidation features such as oxidation rate and band bending relaxation is found for the two oxygen gases in the sputter-cleaned Si(100)2x1 surface and the Ag-deposited Si(100) surface. The higher oxidation rate and the larger band bending relaxation obtained with the normal grade oxygen can be attributed to molecular HzO impurities.
Negative-ion implantation could be used to create nanoparticles in oxide insulators with finely controlled accuracy for both depth and size. For 50-nm-thick SiO 2 film on Si, Ag nanoparticles with 3 nm in diameter were created in the center of the film with distribution thickness of 17 nm. Cu negative-ion implanted silica glass and soda-lime glass showed a high nonlinear susceptance of the 3 rd order in nonlinear optical property. Cu and Ag double-implanted silica glass showed an absorption peak between two absorption peaks of surface plasmon resonance (SPR) for Cu and Ag nanoparticles. The optical absorption peak due to SPR of nanoparticle in oxide could be changed by forming nanoparticles with different kinds of elements and alloy. For application of metal nanoparticle to photocatalyst, Ag negative ions were implanted into rutile TiO 2. The Ag-implanted rutile samples showed improved photocatalytic efficiency after proper annealing in a decolorization test of methylene blue solution under fluorescent light. The better one was the Ag-implanted rutile TiO 2 (Ag: 65 keV, 5x10 16 ions/cm 2 , 500 o C annealed), which showed a photocatalytic efficiency higher by 2.2 times than that of unimplanted rutile TiO 2. In the evaluation under fluorescent light through UV-cut filter for 19 h, the Ag-implanted rutile showed 6.7 times higher efficiency.
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