The large difference in interatomic spacing between GaN and InN is found to give rise to a solid phase miscibility gap. The temperature dependence of the binodal and spinodal lines in the Ga1−xInxN system was calculated using a modified valence-force-field model where the lattice is allowed to relax beyond the first nearest neighbor. The strain energy is found to decrease until approximately the sixth nearest neighbor, but this approximation is suitable only in the dilute limit. Assuming a symmetric, regular-solutionlike composition dependence of the enthalpy of mixing yields an interaction parameter of 5.98 kcal/mole. At a typical growth temperature of 800 °C, the solubility of In in GaN is calculated to be less than 6%. The miscibility gap is expected to represent a significant problem for the epitaxial growth of these alloys.
Infrared photoluminescence (PL) from InSb, InAs, and InAs1−xSbx (x<0.3) epitaxial layers grown by atmospheric pressure organometallic vapor phase epitaxy has been investigated for the first time over an extended temperature range. The values of full width at half maximum of the PL peaks show that the epitaxial layer quality is comparable to that grown by molecular-beam epitaxy. The observed small peak shift with temperature for most InAs1−xSbx epilayers may be explained by wave-vector-nonconserving transitions involved in the PL emission. For comparison, PL spectra from InSb/InSb and InAs/InAs show that the wave-vector-conserving mechanism is responsible for the PL emission. The temperature dependence of the energy band gaps, Eg, in InSb and InAs is shown to follow Varshni’s equation Eg(T)=Eg0−αT2/ (T+β). The empirical constants are calculated to be Eg0=235 meV, α=0.270 meV/K, and β=106 K for InSb and Eg0=415 meV, α=0.276 meV/K, and β=83 K for InAs.
When a semiconductor host is doped by a foreign element, it is inevitable that a volume change will occur in the doped system. This volume change depends on both the size and charge state difference between the dopant and the host element. Unlike the "common expectation" that if the host is deformed to the same size as the dopant, then the formation energy of the dopant would reach a minimum, our first-principles calculations discovered that when an external hydrostatic strain is applied, the change of the impurity formation energy is monotonic: it decreases if the external hydrostatic strain is applied in the same direction as the volume change. This effect also exists when a biaxial strain is applied. A simple strain model is proposed to explain this unusual behavior, and we suggest that strain could be used to significantly improve the doping solubility in semiconductor systems.
The decomposition mechanisms of AsH3, trimethylgallium (TMGa), and mixtures of the two have been studied in an atmospheric-pressure flow system with the use of D2 to label the reaction products which are analyzed in a time-of-flight mass spectrometer. AsH3 decomposes entirely heterogeneously to give H2. TMGa decomposes by a series of gas-phase steps, involving methyl radicals and D atoms to produce CH3D, CH4, C2H6, and HD. TMGa decomposition is accelerated by the presence of AsH3. When the two are mixed, as in the organometallic vapor phase epitaxial growth of GaAs, both compounds decompose in concert to produce only CH4. A likely model is that of a Lewis acid-base adduct that forms and subsequently eliminates CH4.
The phenomenon of spontaneous atomic scale ordering was first reported for semiconductor alloys only ∼5 years ago. Since that time, ordering has been observed in nearly all III/V alloy systems. This paper will describe the ordered structures observed, as well as the extent of ordering, in specific III/V alloys. The effects of ordering on the fundamental properties will be described briefly. The paper will emphasize a summary of our current understanding of the phenomenon. Both thermodynamic and kinetic factors play a role in determining the degree of order for specific epitaxial growth parameters and on which planes the compositional modulations occur.
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