The influence of high energy electron (HEE) irradiation from a Sr-90 radio-nuclide on n-type Ni/4H-SiC samples of doping density 7.1 × 10 15 cm -3 has been investigated over the temperature range 40-300 K. Currentvoltage (I-V), capacitance-voltage (C-V) and deep level transient spectroscopy (DLTS) were used to characterize the devices before and after irradiation at a fluence of 6 × 10 14 electrons-cm -2 . For both devices, the I-V characteristics were well described by thermionic emission (TE) in the temperature range 120 -300 K, but deviated from TE theory at temperature below 120 K. The current flowing through the interface at a bias of 2.0 V from pure thermionic emission to thermionic field emission within the depletion region with the free carrier concentrations of the devices decreased from 7.8 × 10 15 to 6.8 × 10 15 cm -3 after HEE irradiation. The modified Richardson constants were determined from the Gaussian distribution of the barrier height across the contact and found to be 133 and 163 Acm −2 K −2 for as-deposited and irradiated diodes, respectively. Three new defects with energies 0.22, 0.40 and 0.71 eV appeared after HEE irradiation. Richardson constants were significantly less than the theoretical value which was ascribed to a small active device area.

Growth conditions, structural, and optical properties of MgO nanostructure have been investigated. Surface composition and shift in binding energy of Mg at 50.8 eV due to oxidation were examined by core-level spectroscopy. The SEM showed that the film is dense, and grain growth and crystallinity are enhanced by post-deposition annealing. Grain distribution was appraised within the confinement of 24.51 μm 2 from the selected scan areas. X-ray diffraction studies indicated prominent peaks, which are attributed to (111), (200), and (220) reflections from fairly crystallized and randomly oriented MgO thin film. Plane (111) is found to be the preferred orientation of the film. The film transmitted well across the visible spectrum and the estimated energy band gap is 5.41 eV. Absence of catalyst in the electrolyte solution aided the purity of the sample.

We have investigated the current-voltage (I-V) characteristics of nickel (Ni), cobalt (Co), tungsten (W) and palladium (Pd) Schottky contacts on n-type 4H-SiC in the 300-800 K temperature range. Results extracted from I-V measurements of Schottky barrier diodes showed that barrier height (Ф Bo ) and ideality factor (n) were strongly dependent on temperature. Schottky barrier heights for contacts of all the metals showed an increase with temperature between 300 K and 800 K. This was attributed to barrier inhomogeneities at the interface between the metal and the semiconductor, which resulted in a distribution of barrier heights at the interface. Ideality factors of Ni, Co and Pd decreased from 1.6 to 1.0 and for W the ideality factor decreased from 1.1 to 1.0 when the temperature was increased from 300 K to 800 K respectively. The device parameters were compared to assess advantages and disadvantages of the metals for envisaged applications.

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Au/Ni (20:80) Schottky barrier diodes (SBDs) were resistively evaporated on nitrogen-doped n-type 4H-SiC. Current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the SDBs were investigated before and after bombardment with 1.8 MeV proton irradiation at a fluence of 2.0 × 10 12 cm -2 . The measurements were carried out in the temperature range 40 -300 K in steps of 20 K. Results obtained at room temperature (300 K) showed highly rectifying devices before and after bombardment. It was observed that the proton irradiation induced an increase of ideality factor from 1.05 to 1.13, a decrease in Schottky barrier height from 1.40 to 1.22 eV, an increase in series resistance from 10 to 66 Ω and a noticeable increase of the saturation current from 3.0 × 10 -21 to 6.8 × 10 -17 A. The increase in saturation current after proton irradiation was attributed to the presence of interfacial states created by irradiation-induced defects. Thermionic emission dominated the I-V characteristics in the temperature range 120 -300 K but the I-V characteristics deviated from thermionic emission theory at temperatures below 120 K for devices both before and after irradiation. The variation of the SBDs characteristics with temperature was attributed to the presence of lateral inhomogeneities of the SBH. Modified Richardson constants were determined from a Gaussian distribution of barrier heights to be 133 and 165 A cm -2 K -2 before and after irradiation, respectively.

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Lithium manganese oxide thin films were deposited on sodalime glass substrates by metal organic chemical vapour deposition (MOCVD) technique. The films were prepared by pyrolysis of lithium manganese acetylacetonate precursor at a temperature of 420°C with a flow rate of 2.5 dm 3 /min for two-hour deposition period. Rutherford backscattering spectroscopy (RBS), UV-Vis spectrophotometry, X-ray diffraction (XRD) spectroscopy, atomic force microscopy (AFM) and van der Pauw four point probe method were used for characterizations of the film samples. RBS studies of the films revealed fair thickness of 1112.311 (10 15 atoms/cm 2 ) and effective stoichiometric relationship of Li 0.47 Mn 0.27 O 0.26 . The films exhibited relatively high transmission (50 % T) in the visible and NIR range, with the bandgap energy of 2.55 eV. Broad and diffused X-ray diffraction patterns obtained showed that the film was amorphous in nature, while microstructural studies indicated dense and uniformly distributed layer across the substrate. Resistivity value of 4.9 Ω·cm was obtained for the thin film. Compared with Mn 0.2 O 0.8 thin film, a significant lattice absorption edge shift was observed in the Li 0.47 Mn 0.27 O 0.26 film.

Electrically active induced energy levels in semiconductor devices could be beneficial to the discovery of an enhanced p or n-type semiconductor. Nitrogen (N) implanted into 4H-SiC is a high energy process that produced high defect concentrations which could be removed during dopant activation annealing. On the other hand, boron (B) substituted for silicon in SiC causes a reduction in the number of defects. This scenario leads to a decrease in the dielectric properties and induced deep donor and shallow acceptor levels. Complexes formed by the N, such as the nitrogen-vacancy centre, have been reported to play a significant role in the application of quantum bits. In this paper, results of charge states thermodynamic transition level of the N and B vacancy-complexes in 4H-SiC are presented. We explore complexes where substitutional N[Formula: see text]/N[Formula: see text] or B[Formula: see text]/B[Formula: see text] sits near a Si (V[Formula: see text]) or C (V[Formula: see text]) vacancy to form vacancy-complexes (N[Formula: see text]V[Formula: see text], N[Formula: see text]V[Formula: see text], N[Formula: see text]V[Formula: see text], N[Formula: see text]V[Formula: see text], B[Formula: see text]V[Formula: see text], B[Formula: see text]V[Formula: see text], B[Formula: see text]V[Formula: see text] and B[Formula: see text]V[Formula: see text]). The energies of formation of the N related vacancy-complexes showed the N[Formula: see text]V[Formula: see text] to be energetically stable close to the valence band maximum in its double positive charge state. The N[Formula: see text]V[Formula: see text] is more energetically stable in the double negative charge state close to the conduction band minimum. The N[Formula: see text]V[Formula: see text] on the other hand, induced double donor level and the N[Formula: see text]V[Formula: see text] induced a double acceptor level. For B related complexes, the B[Formula: see text]V[Formula: see text] and B[Formula: see text]V[Formula: see text] were energetically stable in their single positive charge state close to the valence band maximum. As the Fermi energy is varied across the band gap, the neutral and single negative charge states of the B[Formula: see text]V[Formula: see text] become more stable at different energy levels. B and N related complexes exhibited charge state controlled metastability behaviour.