Metal-organic chemical vapour deposition of lithium manganese oxide thin films via single solid source precursor

Abstract

Lithium manganese oxide thin films were deposited on sodalime glass substrates by metal organic chemical vapour deposition (MOCVD) technique. The films were prepared by pyrolysis of lithium manganese acetylacetonate precursor at a temperature of 420°C with a flow rate of 2.5 dm 3 /min for two-hour deposition period. Rutherford backscattering spectroscopy (RBS), UV-Vis spectrophotometry, X-ray diffraction (XRD) spectroscopy, atomic force microscopy (AFM) and van der Pauw four point probe method were used for characterizations of the film samples. RBS studies of the films revealed fair thickness of 1112.311 (10 15 atoms/cm 2 ) and effective stoichiometric relationship of Li 0.47 Mn 0.27 O 0.26 . The films exhibited relatively high transmission (50 % T) in the visible and NIR range, with the bandgap energy of 2.55 eV. Broad and diffused X-ray diffraction patterns obtained showed that the film was amorphous in nature, while microstructural studies indicated dense and uniformly distributed layer across the substrate. Resistivity value of 4.9 Ω·cm was obtained for the thin film. Compared with Mn 0.2 O 0.8 thin film, a significant lattice absorption edge shift was observed in the Li 0.47 Mn 0.27 O 0.26 film.

Experimental investigation and numerical simulation of mechanical properties and thermal stability of tin alloy processed by equal channel angular extrusion (ECAE)

“…The effect of the extrusion process can be seen on the peaks with slight broadening compared to the zero-extrusion sample (No-Pass). Slight peak broadening observed can be attributed to the decrease in crystallite size and microstrain [25][26][27]. Peak width due to crystallite size varies inversely with crystallite size, and this is in agreement with the SEM microstructure analysis.…”

Optical Properties of Copper-Zinc Sulphide Network from Mixed Single Solid Source Precursors of Copper and Zinc Dithiocarbamates

“…As organic molecular architecture knowledge improves, MOCVD seems to offer a possible solution to many problems in metal extraction and purification, surface coatings, and chemical synthesis [1]. The attraction of MOCVD is in its adaptability to large area deposition, highquality films, cost-effectiveness, simple apparatus, uniform coverage of the substrate, low-temperature deposition, and growth under high gaseous partial pressure [3,4]. A fundamental part of tailoring properties of the material in the MOCVD technique lies in the proper choice of the molecular precursors, whose design greatly affects the nature and properties of the final product [5].…”

Morphology and photoresponse of crystalline antimony film grown on mica by physical vapor deposition

“…chemical solution deposition, electrochemical deposition, Langmuir-Blodgett films and self-assembled monolayers) and (ii) vapor-phase deposition (e.g. evaporation, chemical vapor deposition, molecular beam epitaxy, atomic layer deposition and sputtering) [14][15][16]. Growth of films on nanoscale involves nucleation which is very vital because it controls the microstructure and crystallinity of the film.…”