The influence of two silver contents (2% and 4%) on NiO films were studied in terms of structural and optical properties. Ag doped NiO films were grown on glass and n-type silicon substrates heated at 400C by chemical pyrolysis method. Optical transmission measurements showed up to 60% transparency in the visible area for undoped NiO and decreased with increasing Ag content. X-ray diffraction assures the existence of epitaxial growth with the c-axis. Average particle size, surface roughness and energy gap were decreased also. Rectifying characteristics of junctions deposited films on n-type silicon has been analyzed. Transparent conductive films showed excellent properties to be adopted for solar cells and optical sensors.
Nanostructured TiO2:Mn thin films at diverse concentrations of Mn were deposited via chemical spray pyrolysis method (CPM). The XRD patterns hexagonal wurtzite structure with a dominant peak towards (101) plane. The Grain size of the deposited films is about (10.71-12.71) nm with Mn, whereas the strain (%) parameter decrease from 32.34 to 27.26 with Mn. AFM images show the TiO2:Mn effects surface morphology of the film, The grain size was in the area of (91.13), (67.79) and (64.94) nm for the (TiO2, TiO2:2% Mn, TiO2:4% Mn) respectively. Surface roughness of TiO2 Thin films are RSM 16.6 to 3.68 nm, The average transmittance of the samples was 75 to 85% in the visible wavelength range from 300 to 900 nm. The bandgap values were 3.35 eV (undoped) to 3.15 eV (4 % Mn).
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