We performed a systematic study of the influence of environmental conditions on the electrical performance characteristics of solution-processed 2,7-dioctyl [1] benzothieno[3,2-b][1]-benzothiophene (C8-BTBT) thin-film transistors (TFTs). Four environmental exposure conditions were considered: high vacuum (HV), O 2 , N 2 , and air. The devices exposed to O 2 and N 2 for 2 h performed in a manner similar to that of the device kept in HV. However, the device exposed to air for 2 h exhibited significantly better electrical properties than its counterparts. The average and highest carrier mobility of the 70 air-exposed C8-BTBT TFTs were 4.82 and 8.07 cm 2 V -1 s -1 , respectively. This can be compared to 2.76 cm 2 V -1 s -1 and 4.70 cm 2 V -1 s -1 , respectively, for the 70 devices kept in HV. Furthermore, device air stability was investigated. The electrical performance of C8-BTBT TFTs degrades after long periods of air exposure. Our work improves knowledge of charge transport behavior and mechanisms in C8-BTBT OTFTs. It also provides ideas that may help to improve device electrical performance further.

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In this work, we systematically investigated the carrier transport of hysteresis-free amorphous InGaZnO (a-IGZO) thin film transistors (TFTs) incorporating high-k (HfO2)x(Al2O3)y gate dielectrics with different composition and permittivity by atomic layer deposition (ALD). A dielectric surface morphology dominated interface scattering carrier transport mechanism is demonstrated, and the effect of the dielectric polarization and the interface states on the carrier mobility is discovered in TFT devices gated by high quality dielectrics with negligible charge trap effect. Accordingly, an a-IGZO TFT gated by (HfO2)0.5(Al2O3)0.5 dielectric with the smoothest surface exhibits the best performance in terms of a preferable field-effect mobility of 18.35 cm2 V-1 s-1, a small subthreshold swing of 0.105 V decade-1, a high on/off current ratio of 4.6× 106, and excellent stability under positive bias stress.

Dielectric capacitors are widely used in pulsed power electronic devices due to their ultrahigh power densities and extremely fast charge/discharge speed. To achieve enhanced energy storage density, maximum polarization (Pmax) and breakdown strength (Eb) need to be improved simultaneously. However, these two key parameters are inversely correlated. In this study, order–disorder transition induced polar nanoregions have been achieved in PbZrO3 thin films by making use of the low-energy ion implantation, enabling us to overcome the trade-off between high polarizability and breakdown strength, which leads to the tripling of the energy storage density from 20.5 to 62.3 J/cm3 as well as the great enhancement of breakdown strength. This approach could be extended to other dielectric oxides to improve the energy storage performance, providing a new pathway for tailoring the oxide functionalities.