Passive submillimeter-wave imaging is a concept that has been in the focus of interest as a promising technology for personal security screening for a number of years. In contradiction to established portal-based millimeter-wave scanning techniques, it allows for scanning people from a distance in real time with high throughput and without a distinct inspection procedure. This opens up new possibilities for scanning, which directly address an urgent security need of modern societies: protecting crowds and critical infrastructure from the growing threat of individual terror attacks. Considering the low radiometric contrast of indoor scenes in the submillimeter range, this objective calls for an extremely high detector sensitivity that can only be achieved using cooled detectors. Our approach to this task is a series of passive standoff video cameras for the 350 GHz band that represent an evolving concept and a continuous development since 2007. Arrays of superconducting transition-edge sensors (TES), operated at temperatures below 1 K, are used as radiation detectors. By this means, background limited performance (BLIP) mode is achieved, providing the maximum possible signal to noise ratio. At video rates, this leads to a temperature resolution well below 1 K. The imaging system is completed by reflector optics based on freeform mirrors. For object distances of 5-25 m, a field of view up to 2 m height and J Infrared Milli Terahz Waves a diffraction-limited spatial resolution in the order of 1-2 cm is provided. Optomechanical scanning systems are part of the optical setup and capable of frame rates of up to 25 frames per second.

The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable: custom design and solutions for specific applications will dominate future development (Fritze in: Panning EM, Liddle JA (eds) Novel patterning technologies. International society for optics and photonics. SPIE, Bellingham, 2021. 10.1117/12.2593229). For this reason, new aspects arise for future lithography, which is why enormous effort has been directed to the development of alternative fabrication technologies. Yet, the technologies emerging from this process, which are promising for coping with the current resolution and accuracy challenges, are only demonstrated as a proof-of-concept on a lab scale of several square micrometers. Such scale is not adequate for the requirements of modern lithography; therefore, there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies. Similar challenges arise because of the technical progress in various other fields, realizing new and unique functionalities based on nanoscale effects, e.g., in nanophotonics, quantum computing, energy harvesting, and life sciences. Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks, which are available at the Technische Universität Ilmenau in the form of nanopositioning and nanomeasuring (NPM) machines. With this equipment, the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters.

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This contribution deals with the analysis of the positioning accuracy of a new Nano Fabrication Machine. This machine uses a planar direct drive system and has a positioning range up to 100 mm in diameter. The positioning accuracy was investigated in different movement scenarios, including phases of acceleration and deceleration. Also, the target position error of certain movements at different positions of the machine slider is considered. Currently, the NFM-100 is equipped with a tip-based measuring system. This Atomic Force Microscope (AFM) uses self-actuating and self-sensing microcantilevers, which can be used also for Field-Emission-Scanning-Probe-Lithography (FESPL). This process is capable of fabricating structures in the range of nanometres. In combination with the NFM-100 and its positioning range, nanostructures can be analysed and written in a macroscopic range without any tool change. However, the focus in this article is on the measurement and positioning accuracy of the tip-based measuring system in combination with the NFM-100 and is verified by repeated measurements. Finally, a linescan, realised using both systems, is shown over a long range of motion of 30 mm.

High technology applications for example in the semiconductor or the optical industry require positioning systems providing repeatability and uncertainty in the range of nanometers together with x-, y-travel ranges of several hundreds of millimeters. We contribute in this research by investigating the applicability of integrated planar direct drives for the realization of nanopositioning- and nanomeasuring machines (NPM/NMM). The paper introduces the concept of planar integrated direct drives and explains the engineering design of the realized system for a 100 mm circular travel range in x and y. It presents the drive system parameters and the arrangement and interaction of the main components. The results of the initial operation are presented with a special focus on the question how the closed loop system can be taken into operation with a free floating slider. The evaluation of the positioning performance leads to the result that a 2D servo error of less than exy = 1.3 nm is achieved at arbitrary positions within the travel range. As a result of repeated step response tests, the positioning resolution is 0.5 nm. The measurement of the coincidental z-movement of the aerostatically supported slider yields a z-vibration with a standard deviation of σz = 0.45 nm. Regarding the drive system these results represent the limit of what can be reached with this setup as the measured error motions are in the range of the noise of the fixed environment setup. By measuring the characteristics of the aerostatic slider support at the fully assembled system the present air bearing stiffness is determined and based on a FEM-simulation of the slider eigenfrequencies the influence on the force transfer behavior is expected to be only marginal.

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Zusammenfassung: In der vorliegenden Arbeit werden zwei Nanopositioniersysteme in Bezug auf ihre Positioniergenauigkeit während der Bewegung verglichen. Beide Systeme besitzen einen planaren Bewegungsbereich von ≥ 100 mm, werden durch Linearmotoren angetrieben und die Position wird durch Laserinterferometer gemessen. Groẞe Unterschiede existieren jedoch im mechanischen Aufbau. Das erste Positioniersystem ist ein zweiachsiger Demonstrator dessen zwei Läufer auf Wälzkörpern gelagert sind. Dies führt zu dem Problem der besonders im Nanometerbereich stark nichtlinearen Reibung. Bei dem zweiten Positioniersystem kommen Luftlager zum Einsatz und darüber hinaus handelt es sich nur um einen Läufer, welcher drei Freiheitsgrade besitzt. Es wird gezeigt, dass durch regelungstechnische Methoden der Reibkraftkompensation die Positioniergenauigkeit beider Systeme bis zu einer Geschwindigkeit von ca. 1 mm/s vergleichbar ist. Schlüsselwörter: Nanopositionierung, Reibungsmodellierung, Positioniergenauigkeit.Abstract: This work compares two fine positioning stages in relation to positioning accuracy during motion. Both systems have a working range of ≥ 100 mm, are driven by linear motors and the position is measured by laser interferometers. However the mechanical setting is quite different. The first system is a two axis fine positioning stage which is supported by ball bearing guides. This leads especially in nanometer range to problems caused by the highly nonlinear friction. In the second system air bearings are used. It can be shown, that by dint of model based control design the position accuracy is comparable until a velocity of 1 mm/s.