Design and performance evaluation of an interferometric controlled planar nanopositioning system

Hesse, Steffen; Schäffel, Christoph; Mohr, Hans-Ulrich; Katzschmann, Michael; Büchner, H.-J.

doi:10.1088/0957-0233/23/7/074011

Cited by 19 publications

(7 citation statements)

References 20 publications

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“…For high accuracy positioning in the x-and y-directions, this machine uses a planar driving system. The slider is moved by three linear actuators, which consist of flat coils and a magnet array each [2]. These actuators are arranged in a single plane and have an angle of 120° between each other.…”

Section: Design Of the Nano Fabrication Machine 100 And The Mounted Amentioning

confidence: 99%

Investigations on Long-Range AFM Scans Using a Nanofabrication Machine (NFM-100)

Stauffenberg

Ortlepp

Reuter

et al. 2020

4th International Conference nanoFIS 2020 - Functional Integrated nanoSystems

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The focus of this work lies on investigations on a new Nano Fabrication Machine (NFM-100) with a mounted atomic force microscope (AFM). This installed tip-based measuring system uses self-sensing and self-actuated microcantilevers, which can be used especially for field-emission scanning probe lithography (FESPL). The NFM-100 has a positioning range of Ø 100 mm, which offers, in combination with the tip-based measuring system, the possibility to analyse structures over long ranges. Using different gratings, the accuracy and the reproducibility of the NFM-100 and the AFM-system will be shown.

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Section: Design Of the Nano Fabrication Machine 100 And The Mounted Amentioning

confidence: 99%

Investigations on Long-Range AFM Scans Using a Nanofabrication Machine (NFM-100)

Stauffenberg

Ortlepp

Reuter

et al. 2020

4th International Conference nanoFIS 2020 - Functional Integrated nanoSystems

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“…Thus, it was possible to achieve a highprecision and fast control of paths of up to 6 mm s −1 [81] on the basis of laser focus probes and laser interferometers [106]. The efficiency of the control systems designed for this purpose was also demonstrated [81,107].…”

Section: State-of-the-art and Own Workmentioning

confidence: 99%

Towards alternative 3D nanofabrication in macroscopic working volumes

Kühnel

Fröhlich

Füßl

et al. 2018

Meas. Sci. Technol.

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This paper gives an overview of the research carried out at TU Ilmenau towards the development and application of tip- and laser-based nanofabrication on flat and curved surfaces in extended macroscopic working areas. It is shown that sub-10 nm structures can be fabricated by scanning probe lithography (SPL). The use of soft stamps has revealed their suitability for nanoimprinting on curved surfaces. Laser-based methods for a maskless exposure of resist on curved surfaces utilising 405 nm laser diodes have already been tested successfully. Furthermore, the current work deals with two-photon polymerisation, which has great potential with regard to the fabrication of sub-wavelength structures. At present, the methods mentioned have all been applied only in working ranges <100 × 100 μm2 in the plane and <10 μm in height. To overcome these limitations, the nanofabrication techniques are now being integrated in the nanopositioning and measuring machines (NPMMs) developed at TU Ilmenau. They offer working volumes of up to 200 × 200 × 25 mm3 with a positioning resolution of 20 pm. To provide access to any geometry elements in the 3D space with nanometre precision, the machine concepts as well as the metrological concepts are further developed. Due to the increased demands of lowest trajectory deviations within the fabrication process, new real-time controllers for probing and fabrication systems are investigated, as well as interactions in combined force and positioning sensors. Further important research is carried out into interference lithography, to enable an exposure of non-planar substrates and to improve the lateral structure resolution at the same time. A mix-and-match combination of such methods that allows the simultaneous exposure of large substrate regions with nanofabrication methods such as SPL becomes possible on the basis of the NPMMs, and is another area of great potential with regard to the research work presented in this paper.

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“…The final design of the stage is based on an extensive review of the state-of-art concerning similar systems and technologies. It applies precision engineering principles and desirable features found in the literature [ 20 , 21 , 22 ]. The final architecture of the whole system is defined by a three-layer and a two-stage scheme, obtaining a compact and symmetrical design.…”

Section: Nanopositioning Stage: Design Overviewmentioning

confidence: 99%

Design Optimization for the Measurement Accuracy Improvement of a Large Range Nanopositioning Stage

Torralba

Yagüe‐Fabra

Albajez

et al. 2016

Sensors

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Both an accurate machine design and an adequate metrology loop definition are critical factors when precision positioning represents a key issue for the final system performance. This article discusses the error budget methodology as an advantageous technique to improve the measurement accuracy of a 2D-long range stage during its design phase. The nanopositioning platform NanoPla is here presented. Its specifications, e.g., XY-travel range of 50 mm × 50 mm and sub-micrometric accuracy; and some novel designed solutions, e.g., a three-layer and two-stage architecture are described. Once defined the prototype, an error analysis is performed to propose improvement design features. Then, the metrology loop of the system is mathematically modelled to define the propagation of the different sources. Several simplifications and design hypothesis are justified and validated, including the assumption of rigid body behavior, which is demonstrated after a finite element analysis verification. The different error sources and their estimated contributions are enumerated in order to conclude with the final error values obtained from the error budget. The measurement deviations obtained demonstrate the important influence of the working environmental conditions, the flatness error of the plane mirror reflectors and the accurate manufacture and assembly of the components forming the metrological loop. Thus, a temperature control of ±0.1 °C results in an acceptable maximum positioning error for the developed NanoPla stage, i.e., 41 nm, 36 nm and 48 nm in X-, Y- and Z-axis, respectively.

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Design and performance evaluation of an interferometric controlled planar nanopositioning system

Cited by 19 publications

References 20 publications

Investigations on Long-Range AFM Scans Using a Nanofabrication Machine (NFM-100)

Investigations on Long-Range AFM Scans Using a Nanofabrication Machine (NFM-100)

Towards alternative 3D nanofabrication in macroscopic working volumes

Design Optimization for the Measurement Accuracy Improvement of a Large Range Nanopositioning Stage

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