Variable magnetic field Hall effect, photoluminescence, and capacitance-voltage ͑CV͒ analysis have been used to study InN layers grown by plasma assisted molecular beam epitaxy. All three techniques reveal evidence of a buried p-type layer beneath a surface electron accumulation layer in heavily Mg-doped samples. Early indications suggest the Mg acceptor level in InN may lie near 110 meV above the valence band maximum. The development of p-type doping techniques offers great promise for future InN based devices.
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