Indium antimonide MWIR Focal Plane Array (FPA) have been developed and investigated. FPA consists of two dimensional anys of InSb photodiodes bonded by indium bumps with CMOS-multiplexer and Split-Stirling cooler. Noise equivalent power NEP 7lO' W/pixel and dynamic range 60÷70 dB at frame frequency (800÷1000) Hz.
The paper deals with the problems that appear in the electron-beam processing of insulators and consist in distortion of the surface pattern created by an electron beam. There are presented the results of theoretical and experimental studies on the phenomena in insulators, which are powered by the electron-beam processing of their surfaces, and the effect of these phenomena on the precision ofthe processing.Key words: electron-beam processing of insulators, high-energy electrons, hole-electron pairs, trapped space charge, deflecting field, secondary emission
ThTRODUCTIONPrecise electron-beam processing of solids is one of the branches of electron-beam technology and is of great interest for a multiplicity of uses. In the presented paper we discuss the physical grounds of the problems appeared in the processing of insulators and consisting in strong distortion of the surface pattern created by an electron beam. These problems rise from the fact that the incident electron beam not only causes strong local heating of the substance, but also introduces an electric charge into the heated region. In the processing of conductive materials this charge leaves the conductor very fast under its own electric field and has no essential effect. The processing of insulators is another matter. The case is that the insulator always contains only few of free carriers and a high concentration of traps. The electrons introduced into an insulator by electron beam are captured by the traps, where they may exist for a very long time. The captured charge is accumulated in the traps through time and is not screened by free carriers for their low concentration. This is why this charge creates a high electric field inside and outside the insulator. The outside field deflects the beam from the planned point of its incidence on the surface. This problem of e-beam technology lies at the interface between electron optics and physics of insulators.To be specific, the further discussion is held for the case of e-beam engraving of solid surfaces. This problem is quite interesting in practice by itself. The main conclusions drawn in studies of it remain true for other kinds of e-beam processing of insulators. In the industrial e-beam engraving of glass surfaces one came up against the lack of the reproducibility of the drawings deposited on the surfaces. Among the high-quality drawings the distorted ones appeared occasionally. This work is aimed at finding the causes ofthese distortions and the ways to remedy them.
PHYSICAL MODEL OF E-BEAM PROCESSING OF INSULATORSFirst consider the way a pattern is created while e-beam processing of a surface. The pattern consists of a number of dots with radii of the order of 100 mkm separated by a distance of the same order. Each dot is created by a short and powerful pulse ofthe electrons accelerated to the energy about 50 KeV. The typical time ofthe pulse is 10-20 mkswith a current of-1 mA in it. The e-beam pulse incident on a solid surface leads to local heating, melting, evaporation of the substance and form...
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