A simple model is proposed, which is able to calculate VTH standard deviation due to random dopant placement in the channel, for arbitrary vertical impurity distributions. Substantial decrease in VTH fluctuation, while keeping VTH the same, is confirmed for low surface impurity channel MOSFETs, in agreement with the model prediction.

Heterojunction p-Cu2O/n-β-Ga2O3 diodes were fabricated on an epitaxially grown β-Ga2O3(001) layer. The reverse breakdown voltage of these p-n diodes reached 1.49 kV with a specific on-resistance of 8.2 mΩ cm2. The leakage current of the p-n diodes was lower than that of the Schottky barrier diode due to the higher barrier height against the electron. The ideality factor of the p-n diode was 1.31. It indicated that some portion of the recombination current at the interface contributed to the forward current, but the diffusion current was the dominant. The forward current more than 100 A/cm2 indicated the lower conduction band offset at the hetero-interface between Cu2O and Ga2O3 layers than that predicted from the bulk properties, resulting in such a high forward current without limitation. These results open the possibility of advanced device structures for wide bandgap Ga2O3 to achieve higher breakdown voltage and lower on-resistance.

This paper describes the design and experimental results of a 1.8-V single-chip CMOS MMIC front-end for 2.4-GHz band short-range wireless communications, such as Bluetooth and wireless LANs. The IC consists of fundamental RF building circuits-a power amplifier (PA), a low-noise amplifier (LNA), and a transmit/receive-antenna switch (SW), including almost all on-chip matching elements. The IC was fabricated using a 0.18-m standard bulk CMOS technology which has no extra processing steps to enhance the RF performances. Two new circuit-design techniques are introduced in the IC in order to minimize the insertion loss of the SW and realize a higher gain for the PA and LNA despite the utilization of the standard bulk CMOS technology. The first is the derivation of an optimum gate width of the SW to minimize the insertion loss based on small-signal equivalent circuit analysis. The other is the revelation of the advantages of interdigitated capacitors (IDCs) over conventional polysilicon to polysilicon capacitors and the successful use of the IDCs in the LNA and PA. The IC achieves the following sufficient characteristics for practical wireless terminals at 2.4 GHz and 1.8 V: a 5-dBm transmit power at a 1-dB gain compression, a 19-dB gain, an 18-mA current for the PA, a 1.5-dB insertion loss, more than 24-dB isolation, an 11-dBm power handling capability for the SW, a 7.5-dB gain, a 4.5-dB noise figure, and an 8-mA current for the LNA.

In this study, we successfully fabricated vertical GaN merged PiN Schottky (MPS) diodes and comparatively investigated the cyclic p-GaN width (Wp) dependence of their electrical characteristics, including turn-on voltage and reverse leakage current. The MPS diodes with Wp of more than 6 µm can turn on at around 3 V. Increasing Wp can suppress the reverse leakage current. Moreover, the vertical GaN MPS diode with the breakdown voltage of 2 kV was realized for the first time.

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