The use of lithium fluoride ͑LiF͒ crystals and films as imaging detectors for EUV and soft-x-ray radiation is discussed. The EUV or soft-x-ray radiation can generate stable color centers, emitting in the visible spectral range an intense fluorescence from the exposed areas. The high dynamic response of the material to the received dose and the atomic scale of the color centers make this detector extremely interesting for imaging at a spatial resolution which can be much smaller than the light wavelength. Experimental results of contact microscopy imaging of test meshes demonstrate a resolution of the order of 400 nm. This high spatial resolution has been obtained in a wide field of view, up to several mm 2 . Images obtained on different biological samples, as well as an investigation of a soft x-ray laser beam are presented. The behavior of the generated color centers density as a function of the deposited x-ray dose and the advantages of this new diagnostic technique for both coherent and noncoherent EUV sources, compared with CCDs detectors, photographic films, and photoresists are discussed.
This article reports on the utilization of X-ray microradiography and laser induced breakdown spectroscopy (LIBS) techniques for investigation of the metal accumulation in different part of leaf samples. The potential of the LIBS-analysis for finding the proper plant species for phytoremediation is compared with the results of microradiography measurements at the HERCULES source at ENEA, Rome (Italy) and X-ray microradiography experiments at the ELETTRA Synchrotron, Trieste (Italy).
We have studied the feasibility of high-resolution laser interference lithography using a tabletop 46.9nm, 1.5ns Ar laser, combined with two different optical configurations based on a Lloyd’s mirror interferometer. Using one of these schemes we have encoded periodic grating structures with a half pitch of 42nm and a vertical modulation of 5nm on a commercial PMMA photoresist. Experiments performed with larger half-pitch structures and detailed theoretical calculations demonstrate the potentiality of producing periodic structures with a half-pitch resolution down to 20nm and a height of up to 60nm. The results can be of considerable interest for the development of a complete high-resolution lithographic process operating with the 47nm laser wavelength.
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