We demonstrate thin-film GaSb solar cells which are isolated from a GaSb substrate and transferred to a Si substrate. We epitaxially grow ∼3.3 μm thick GaSb P on N diode structures on a GaSb substrate. Upon patterning in 2D arrays of pixels, the GaSb films are released via epitaxial lift-off and they are transferred to Si substrates. Encapsulation of each pixel preserves the structural integrity of the GaSb film during lift-off. Using this technique, we consistently transfer ∼4 × 4 mm2 array of pixelated GaSb membranes to a Si substrate with a ∼ 80%–100% yield. The area of individual pixels ranges from ∼90 × 90 μm2 to ∼340 × 340 μm2. Further processing to fabricate photovoltaic devices is performed after the transfer. GaSb solar cells with lateral sizes of ∼340 × 340 μm2 under illumination exhibit efficiencies of ∼3%, which compares favorably with extracted values for large-area (i.e., 5 × 5 mm2) homoepitaxial GaSb solar cells on GaSb substrates.
Monolithic integration of lattice-mismatched semiconductor materials opens up access to a wide range of bandgaps and new device functionalities. However, it is inevitably accompanied by defect formation. A thorough analysis of how these defects propagate and interact with interfaces is critical to understanding their effects on device parameters. Here, we present a comprehensive study of dislocation networks in the GaSb/GaAs heteroepitaxial system using transmission electron microscopy (TEM). Specifically, the sample analyzed is a GaSb film grown on GaAs using dislocation–reduction strategies such as interfacial misfit array formation and introduction of a dislocation filtering layer. Using various TEM techniques, it is shown that such an analysis can reveal important information on the dislocation behavior including filtering mechanism, types of dislocation reactions, and other interactions with interfaces. A novel method that enables plan-view imaging of deeply embedded interfaces using TEM and a demonstration of independent imaging of different dislocation types are also presented. While clearly effective in characterizing dislocation behavior in GaSb/GaAs, we believe that the methods outlined in this article can be extended to study other heteroepitaxial material systems.
We demonstrate a low power thermally induced optical bistability at telecom wavelengths and room temperature using a nanobeam photonic crystal cavity embedded with an ensemble of quantum dots. The nanobeam photonic crystal cavity is transfer-printed onto the edge of a carrier chip for thermal isolation of the cavity with an efficient optical coupling between the nanobeam waveguide and optical setup. Reflectivity measurements performed with a tunable laser reveal the thermo-optic nature of the nonlinearity. A bistability power threshold as low as 23 μW and an on/off response contrast of 6.02 dB are achieved from a cavity with a moderately low quality factor of 2830. Our device provides optical bistability at power levels an order of magnitude lower than previous quantum-dot-based devices.
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