2018
DOI: 10.1016/j.solmat.2018.05.008
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Reducing threading dislocation density in GaSb photovoltaic devices on GaAs by using AlSb dislocation filtering layers

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Cited by 14 publications
(8 citation statements)
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References 33 publications
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“…Nevertheless, these parameters are close to recently reported progress on GaSb-on-GaAs cells. In particular, the measured JSC and FF are in between the values reported in [31] and [33]. Both references used front/back contact configurations.…”
Section: Gasb-on-gasb Control Solar Cellmentioning
confidence: 61%
See 1 more Smart Citation
“…Nevertheless, these parameters are close to recently reported progress on GaSb-on-GaAs cells. In particular, the measured JSC and FF are in between the values reported in [31] and [33]. Both references used front/back contact configurations.…”
Section: Gasb-on-gasb Control Solar Cellmentioning
confidence: 61%
“…It seems that this partially compensated for the much larger lattice-mismatch (12% vs 8% in the case of GaSb-on-GaAs cells). The use of a thicker buffer (twice or more as thick as the ones used in [31] and [33]) also likely contributed to the lattice-mismatch compensation. However, the VOC is lower in both cases, suggesting a still higher TDD in the active zone.…”
Section: Gasb-on-gasb Control Solar Cellmentioning
confidence: 99%
“…Gallium antimonide (GaSb) is a valuable material for applications in field-effect transistors, multi-junction solar cells, lasers, infrared detectors, and Shockley diodes. In addition, the molecular beam epitaxial is a common method to grow materials. Moreover, the reason why the development opportunity is taken by various electronic devices is that GaSb keeps some advantages of physical properties …”
Section: Introductionmentioning
confidence: 99%
“…Despite many years of development, the performances of the structures grown on the IMF-GaSb-buffered GaAs substrates are lower than those grown on the native substrates [11][12][13][14]. This justifies renewed efforts of many research groups to optimize this relaxation mode either by optimizing the growth conditions [15,16] or by applying an additional buffer in a GaSb/GaAs system [17][18][19][20][21]. The latter approach has shown significant promise.…”
Section: Introductionmentioning
confidence: 99%
“…The reduction of the threading dislocation density was visualized in TEM images, but no reference to the quantitative analysis was given. The influences of the growth temperature and the distance of the AlSb layer from the GaSb/GaAs interface on TDD were investigated by Mansoori et al [21]. The authors concluded that both low-temperature growth at 420 °C and 250 nm distance promoted the reduction of threading dislocations.…”
Section: Introductionmentioning
confidence: 99%