A: Chromium compensated GaAs sensors have been characterized using the chargeintegrating readout chip JUNGFRAU. Due to its low noise performance and 75 × 75 µm 2 pixel size, JUNGFRAU enables a precise measurement of the charge (of either polarity) with a high spatial resolution.Several sensor parameters like dark current, noise and spectral performance as well as the charge transport properties of the electrons have been determined. The short lifetime of holes in GaAs:Cr gives rise to an effect where pixels adjacent to a pixel with a photon hit show a strong negative signal when being absorbed close to the readout electrode. This so-called 'crater effect' has been simulated and allows an estimation of the hole lifetime in GaAs:Cr.
Semi-insulating wafers of GaAs material with a thickness of 500 µm have been compensated with chromium by Tomsk State University. Initial measurements have shown the material to have high resistivity (3 × 10 9 Ω cm) and tests with pixel detectors on a 250 µm pitch produced uniform spectroscopic performance across an 80 × 80 pixel array. At present, there is a lack of detectors that are capable of operating at high X-ray fluxes (> 10 8 photons s −1 mm −2 ) in the energy range 5-50 keV. Under these conditions, the poor stopping power of silicon, as well as issues with radiation hardness, severely degrade the performance of traditional detectors. While high-Z materials such as CdTe and CdZnTe may have much greater stopping power, the formation of space charge within these detectors degrades detector performance. Initial measurements made with GaAs:Cr detectors suggest that many of its material properties make it suitable for these challenging conditions. In this paper the radiation hardness of the GaAs:Cr material has been measured on the B16 beam line at the Diamond Light Source synchrotron. Small pixel detectors were bonded to the STFC Hexitec ASIC and were irradiated with 3 × 10 8 photons s −1 mm −2 monochromatic 12 keV X-rays up to a maximum dose of 0.6 MGy. Measurements of the spectroscopic performance before and after irradiation have been used to assess the extent of the radiation damage.
In order to meet the needs of some ESRF beamlines for highly efficient 2D X-ray detectors in the 20-50 keV range, GaAs:Cr pixel sensors coupled to TIMEPIX readout chips were implemented into a MAXIPIX detector. Use of GaAs:Cr sensor material is intended to overcome the limitations of Si (low absorption) and of CdTe (fluorescence) in this energy range The GaAs:Cr sensor assemblies were characterised with both laboratory X-ray sources and monochromatic synchrotron X-ray beams. The sensor response as a function of bias voltage was compared to a theoretical model, leading to an estimation of the µτ product of electrons in GaAs:Cr sensor material of 1.6 × 10 −4 cm 2 /V. The spatial homogeneity of X-ray images obtained with the sensors was measured in different irradiation conditions, showing a particular sensitivity to small variations in the incident beam spectrum. 2D-resolved elemental mapping of the sensor surface was carried out to investigate a possible relation between the noise pattern observed in X-ray images and local fluctuations in chemical composition. A scanning of the sensor response at subpixel scale revealed that these irregularities can be correlated with a distortion of the effective pixel shapes.
Chromium compensated GaAs or GaAs:Cr sensors provided by the Tomsk State University (Russia) were characterized using the low noise, charge integrating readout chip JUNGFRAU with a pixel pitch of 75 × 75 µm2 regarding its application as an X-ray detector at synchrotrons sources or FELs. Sensor properties such as dark current, resistivity, noise performance, spectral resolution capability and charge transport properties were measured and compared with results from a previous batch of GaAs:Cr sensors which were produced from wafers obtained from a different supplier. The properties of the sample from the later batch of sensors from 2017 show a resistivity of 1.69 × 109 Ω/cm, which is 47% higher compared to the previous batch from 2016. Moreover, its noise performance is 14% lower with a value of (101.65 ± 0.04) e- ENC and the resolution of a monochromatic 60 keV photo peak is significantly improved by 38% to a FWHM of 4.3%. Likely, this is due to improvements in charge collection, lower noise, and more homogeneous effective pixel size. In a previous work, a hole lifetime of 1.4 ns for GaAs:Cr sensors was determined for the sensors of the 2016 sensor batch, explaining the so-called “crater effect” which describes the occurrence of negative signals in the pixels around a pixel with a photon hit due to the missing hole contribution to the overall signal causing an incomplete signal induction. In this publication, the “crater effect” is further elaborated by measuring GaAs:Cr sensors using the sensors from 2017. The hole lifetime of these sensors was 2.5 ns. A focused photon beam was used to illuminate well defined positions along the pixels in order to corroborate the findings from the previous work and to further characterize the consequences of the “crater effect” on the detector operation.
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