X-ray reflectivity and X-ray photoelectron spectroscopy studies on reactively sputtered $$\hbox {Nb}_{2}\hbox {O}_{5}$$-based thin-film devices

Abstract

The reactively sputtered Nb 2 O 5-based metal-oxide-semiconductor devices deposited under different O 2 ∕Ar ratios have been studied using laboratory-based X-ray reflectivity (XRR) and synchrotron-based X-ray photoelectron spectroscopy techniques. The I − V characteristics reveal a sharp transition in the magnitude of current (∼ up to five orders) signifying a switching phenomenon between high-resistance and low-resistance states. The electron density profile, derived from XRR data, shows a dependence of the switching properties on the film porosity. Further, the non-lattice oxygen in the film also plays a role in determining the on/off ratio of the devices. Therefore, besides the presence of non-lattice oxygen, film porosity also influences the resistive switching behavior of the Nb 2 O 5-based devices.

Pseudohexagonal Nb2O5‐Decorated Carbon Nanotubes as a High‐Performance Composite Anode for Sodium Ion Batteries

“…The existence of these chemical states illustrates the existence of heteroatom‐containing functional groups on the surface of the Nb 2 O 5 /g‐CNT composite. The peak in the O 1s spectrum (Figure 2c) centred at 530.5 eV can be assigned to the Nb−O bond, whereas the one centred at 532.2 eV corresponds to the organic C=O bond and the peak centred at 533.6 eV represents the C−O bond [62] . Figure 2d presents the XPS spectrum of Nb 3d.…”

“…The peak in the O 1s spectrum (Figure 2c) centred at 530.5 eV can be assigned to the NbÀ O bond, whereas the one centred at 532.2 eV corresponds to the organic C=O bond and the peak centred at 533.6 eV represents the CÀ O bond. [62] Figure 2d presents the XPS spectrum of Nb 3d. The peaks located at 207.4 eV and 210.2 eV derive from the Nb 5 + 3d 5/2 and Nb 5 + 3d 3/ 2 , respectively.…”

Experimental Techniques for the Characterization of Magnetic Thin Films

“…X-Ray reflectivity (XRR) measurement can be performed using X-Ray Diffractometer to estimate the thickness of the thin films when the thickness lies in a range of 10-300 nm and their surface and interface roughness is not too large (Yasaka, 2010;Islam et al, 2020;Verna et al, 2021). In this measurement, the incident X-ray strikes the surface of the film at very low incidence angle θi (grazing angle) as depicted in Figure 6.…”

“…X-ray Photoelectron Spectroscopy (XPS) is a commonly used surface analysis technique that provides valuable insights into the surface chemistry of a wide range of materials, including metals, semiconductors, polymers, ceramics, and thin films (Islam et al, 2020;Greczynski and Hultman, 2020;Greczynski and Hultman, 2022;Sancho-Albero et al, 2023). Basically, it is a non-destructive analytical technique which is mainly used to analysis the elemental composition, chemical bonding, and electronic state of a material's surface.…”