“…Owing to a large bandgap (E g > 8 eV (1,2)), wurtzite crystal structure (3,4), and high solid solubility (5), beryllium oxide (BeO) has recently become of significant interest as an alloying agent with wide bandgap semiconductor zinc oxide (ZnO, E g = 3.3 eV) for bandgap engineering and charge carrier confinement in various oxide semiconductor based optoelectronic devices (5)(6)(7)(8)(9)(10)(11)(12)(13)(14)(15)(16). BeO also exhibits many other excellent properties (1,(17)(18)(19)(20)(21) including a high dielectric constant (k = 6.7), high breakdown field (E bd > 6 MV/cm), high thermal conductivity (κ > 15 W/mK), and high hardness (H > 30 GPa) that makes it an excellent choice as an insulating gate dielectric (22,23), passivation layer (24,25), diffusion barrier (24), or epitaxial seed layer (27)(28)(29)(30) for both narrow (23,31) and wide bandgap semiconductor devices (32)(33)(34)(35)(36).…”