Visible Light Maskless Photolithography for Biomachining Application

Suwandi, Dedi; Whulanza, Yudan; Istiyanto, Jos

doi:10.4028/www.scientific.net/amm.493.552

Cited by 13 publications

(8 citation statements)

References 11 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…A gelatin-Rose Bengal mixture was coated on the surface of the glass plate coverslip by using a spin coater to obtain uniform thickness. Next, the mixture was exposed to a commercial DLP Projector Infocus TM at 500-550 nm (approximately yellow-green at the visible light level), as depicted in figure 1 [18]. This study applied a yellow color (in the Red Green Blue (RGB) color model: 255,255,0) as the light resource.…”

Section: B Photo-patterning Processmentioning

confidence: 99%

Realization of Photo-curing Gelatin Hydrogel using a Commercial Projector for Culturing Mesenchymal Cells

Whulanza

Harahap

Istiyanto

et al. 2019

Int. J. Adv. Sci. Eng. Inf. Technol.

Self Cite

View full text Add to dashboard Cite

This paper investigates the realization of synthetic extracellular matrix with visible light photo-patterning gelatin in a simpler manner. A synthetic extracellular matrix provides an initial attachment for the seeded cells on the experimental substrate such as glass plate or multi-well until they realized their the natural extracellular matrix. Here, a commercial Digital Light Projector (DLP) was used to induce gelatin with Rose Bengal as a crosslinking agent to form the thin layer on the experimental substrate. Various gelatin concentrations from 2%-10% were exposed at different times in order to optimize the patterning process. A geometrical characterization on the patterned gelatin, such as contour measurement and resolution, were taken place. Results showed that the thickness of patterned gelatin was in the range of 10 µm -60 µm depends on the exposure time of the DLP projector. Moreover, a visual method aided by the Fiji toolbox from NIH ImageJ image processing was used to observe the density and spatial arrangement of the cultured cells on the substrate. Ultimately, biocompatibility using MTT assay was also employed to confirm the viability of the cells on the gelatin substrate. The results show that we are able to control the physical and spatial arrangement of the gelatin substrate, and they with cell viability depend on 6 days of observation. It was found that the gelatin substrate provides faster growth on cultured cells compared to the control study. This finding leads to the possibility to realize the automation system in cell culture technology with an affordable investment.

show abstract

Section: B Photo-patterning Processmentioning

confidence: 99%

Realization of Photo-curing Gelatin Hydrogel using a Commercial Projector for Culturing Mesenchymal Cells

Whulanza

Harahap

Istiyanto

et al. 2019

Int. J. Adv. Sci. Eng. Inf. Technol.

Self Cite

View full text Add to dashboard Cite

show abstract

“…The PCB with photoresist dry film was exposed to a black color from the DLP projector beam, generated from a laptop connected to the projector. The exposure process was performed for seven minutes (Suwandi et al, 2014) using black (R = 0, G = 0, B = 0) by setting the custom color on Powerpoint. After exposure, the PCB with photoresist was inserted into the developing solution for a variation of time from one to five minutes.…”

Section: Developing Time With Black Color Exposurementioning

confidence: 99%

“…This experiment aimed to determine the effect of light blue color (R = 0, G = 172, B = 240) emitted from the DLP projector upon negative dry film photoresist. The light blue color was selected based on previous maskless photolithography experiments (Suwandi et al, 2014). This experiment's steps are identical to the previous process (section 2.3), changing black for light blue color and increasing the exposure time to five minutes.…”

Section: Exposure Time With Light Blue Color and Developing Without Smentioning

confidence: 99%

“…The maskless photolithography method was then modified further by using an unmodified commercial DLP projector (Suwandi et al, 2014), and was successfully applied to copper by using bacteria Acidithiobacillus ferrooxidans NBRC 14262 as a scraper (a form of biomachining). This process produced a path profile with the smallest size of 180 μm and 26 μm deviations.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Dry Film Photoresist Application to a Printed Circuit Board (Pcb) using a Maskless Photolithography Method

Suwandi¹,

Aziz²,

Sifa³

et al. 2019

IJTech

Self Cite

View full text Add to dashboard Cite

This paper offers an alternative method of making PCB routing using a negative dry film photoresist and a maskless photolithography method. The objective of this research is to determine the correct parameters for the process of making PCB design easier, cheaper and safer. Electronic circuit design was created on a laptop or PC using Autodesk EAGLE software with a combination of result is black and blue light color. PCB routing design was inserted into a PowerPoint slide to display on a commercial Digital Light Processing (DLP) projector. No modifications were made to a projector, which was mounted directly on a stand with a downward facing position. The projector lamp replaced an ultraviolet or X-ray source during the exposure process, exposing PCB coated in negative dry film photoresist. After the exposure process, the PCB was inserted into the developer solution, causing the blue light irradiated part to remain while the blackened sections dissolved. The PCB was then added to an etching solution to scrape the copper unprotected by the photoresist. The PCB was finally soaked in a remover solution to remove the photoresist. Once complete, the process generated a laptop-designed PCB routing. Electrical lines can be created using this method with a size of 100 µm and a lane edge deviation of 5 µm. The goal of research to make PCB routing cheaper, easier and safer was achieved. Evidenced by the installation of electronic components and then tested, the results are all components function well.

show abstract

“…[22][23][24][25] Photolithography, which is also known as optical lithography, is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate. The first step of photolithography is the substrate preparation, where the substrate is cleaned to remove any undesired substances, such as water, from the substrate surface.…”

Section: Physical Scaling Challengingmentioning

confidence: 99%

Physical principles and current status of emerging non-volatile solid state memories

Wang

Yang

Wen

2015

Electron. Mater. Lett.

View full text Add to dashboard Cite

Today the influence of non-volatile solid-state memories on persons' lives has become more prominent because of their non-volatility, low data latency, and high robustness. As a pioneering technology that is representative of non-volatile solidstate memories, flash memory has recently seen widespread application in many areas ranging from electronic appliances, such as cell phones and digital cameras, to external storage devices such as universal serial bus (USB) memory. Moreover, owing to its large storage capacity, it is expected that in the near future, flash memory will replace hard-disk drives as a dominant technology in the mass storage market, especially because of recently emerging solid-state drives. However, the rapid growth of the global digital data has led to the need for flash memories to have larger storage capacity, thus requiring a further downscaling of the cell size. Such a miniaturization is expected to be extremely difficult because of the well-known scaling limit of flash memories. It is therefore necessary to either explore innovative technologies that can extend the areal density of flash memories beyond the scaling limits, or to vigorously develop alternative non-volatile solid-state memories including ferroelectric random-access memory, magnetoresistive random-access memory, phase-change random-access memory, and resistive random-access memory. In this paper, we review the physical principles of flash memories and their technical challenges that affect our ability to enhance the storage capacity. We then present a detailed discussion of novel technologies that can extend the storage density of flash memories beyond the commonly accepted limits. In each case, we subsequently discuss the physical principles of these new types of non-volatile solid-state memories as well as their respective merits and weakness when utilized for data storage applications. Finally, we predict the future prospects for the aforementioned solid-state memories for the next generation of data-storage devices based on a comparison of their performance.

show abstract

Visible Light Maskless Photolithography for Biomachining Application

Cited by 13 publications

References 11 publications

Realization of Photo-curing Gelatin Hydrogel using a Commercial Projector for Culturing Mesenchymal Cells

Realization of Photo-curing Gelatin Hydrogel using a Commercial Projector for Culturing Mesenchymal Cells

Dry Film Photoresist Application to a Printed Circuit Board (Pcb) using a Maskless Photolithography Method

Physical principles and current status of emerging non-volatile solid state memories

Contact Info

Product

Resources

About