25th European Mask and Lithography Conference 2009
DOI: 10.1117/12.835181
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UV NIL template making and imprint evaluation

Abstract: UV NIL shows excellent resolution capability with remarkable low line edge roughness, and has been attracting pioneers in the industry who were searching for the finest patterns.We have been focused on the resolution improvement in NIL template making with a 100keV acceleration voltage spot beam EB writer process, and have established a template making process to meet the requirements of the pioneers. Usually such templates needed just a small field (several hundred microns square or so)Now, for several semico… Show more

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