Status of UV Imprint Lithography for Nanoscale Manufacturing

Singh, Thakur Raghu Raj; Sreenivasan, S. V.; Choi, Jin; Schumaker, Philip; Xu, Feng

doi:10.1016/b978-0-12-374396-1.00123-9

Cited by 19 publications

(20 citation statements)

References 72 publications

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“…27–28 If the template surface is made highly non-wetting to improve release performance, it will cause partial filling of the features on the template and poor imprint pattern fidelity. 28 Moreover, adhesion between the imprint solution and the underlying release layer needs to be greater than the adhesion between the imprint solution and the template surface. When PVA is used as the underlying release layer, the PEGDA imprint solution adheres to the PVA surface due to weak H-bonds and physical entanglement of the polymeric PEGDA chains into the PVA surface.…”

Section: Resultsmentioning

confidence: 99%

“…28, 31–33 The contact angle was found to increase somewhat when the Ca 2+ treated PAA release layer is used with the water- or DMSO- based imprint solutions, suggesting decreased wetting behavior. This however did not affect the template filling and there was adequate adhesion between the cured resist and the Ca 2+ treated PAA surface as shown by successful imprinting and release of particles in figure 5.…”

Section: Resultsmentioning

confidence: 99%

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Scalable Imprinting of Shape-Specific Polymeric Nanocarriers Using a Release Layer of Switchable Water Solubility

et al. 2012

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There is increasing interest in fabricating shape-specific polymeric nano and microparticles for efficient delivery of drugs and imaging agents. The size and shape of these particles could significantly influence their transport properties and play an important role in in vivo biodistribution, targeting and cellular uptake. Nanoimprint lithography methods, such as Jet-and-flash imprint lithography (J-FIL), provide versatile top-down processes to fabricate shape-specific, biocompatible nanoscale hydrogels that can deliver therapeutic and diagnostic molecules in response to disease-specific cues. However, the key challenges in top-down fabrication of such nanocarriers are scalable imprinting with biological and biocompatible materials, ease of particle-surface modification using both aqueous and organic chemistry as well as simple yet biocompatible harvesting. Here we report that a biopolymer-based sacrificial release layer in combination with improved nanocarrier-material formulation can address these challenges. The sacrificial layer improves scalability and ease of imprint-surface modification due to its switchable solubility through simple ion exchange between monovalent and divalent cations. This process enables large-scale bio-nanoimprinting and efficient, one-step harvesting of hydrogel nanoparticles in both water- and organic-based imprint solutions.

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Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Scalable Imprinting of Shape-Specific Polymeric Nanocarriers Using a Release Layer of Switchable Water Solubility

et al. 2012

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“…In this regard, nanoimprint lithography [20] - [24] has been demonstrated as a high throughput, low-cost lithographic technique capable of patterning arbitrary geometries with demonstrated sub-10 nm feature resolution. Moreover, multilevel imprint lithography has been demonstrated to pattern multilevel structures with high-fidelity by replicating an existing multilevel pattern on the template [25][26][27][28].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of self-aligned multilevel nanostructures

Joseph

Singhal

Abed

et al. 2017

Microelectronic Engineering

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“…However, as critical feature sizes have shrunk to the deep subwavelength regions, the use of photolithography for patterning has become increasingly complex and costly. This has spurred the development of high-resolution nano-imprint lithography techniques that pattern substrates through mechanical contact rather than optical means [6].…”

Section: Introductionmentioning

confidence: 99%

“…While there are several different flavors of nano-imprint lithography, one of the more commercially relevant variants is Jet-and-Flash Imprint Lithography (J-FIL TM ), as shown in Fig. 1 [6]. It has been used in the commercial patterning of CMOS logic and memory devices as well as hard disk media.…”

Section: Introductionmentioning

confidence: 99%

Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes

Singhal

Grigas

Sreenivasan

2016

Journal of Micro and Nano-Manufacturing

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In spite of the great progress made toward addressing the challenge of particle contamination in nanomanufacturing, its deleterious effect on yield is still not negligible. This is particularly true for nanofabrication processes that involve close proximity or contact between two or more surfaces. One such process is Jet-and-Flash Imprint Lithography (J-FIL™), which involves the formation of a nanoscale liquid film between a patterned template and a substrate. In this process, the presence of any frontside particle taller than the liquid film thickness, which is typically sub-25 nm, can not only disrupt the continuity of this liquid film but also damage the expensive template upon contact. The detection of these particles has typically relied on the use of subwavelength optical techniques such as scatterometry that can suffer from low throughput for nanoscale particles. In this paper, a novel mechanics-based method has been proposed as an alternative to these techniques. It can provide a nearly 1000 × amplification of the particle size, thereby allowing for optical microscopy based detection. This technique has been supported by an experimentally validated multiphysics model which also allows for estimation of the loss in yield and potential contact-related template damage because of the particle encounter. Also, finer inspection of template damage needs to be carried out over a much smaller area, thereby increasing throughput of the overall process. This technique also has the potential for inline integration, thereby circumventing the need for separate tooling for subwavelength optical inspection of substrates.

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Status of UV Imprint Lithography for Nanoscale Manufacturing

Cited by 19 publications

References 72 publications

Scalable Imprinting of Shape-Specific Polymeric Nanocarriers Using a Release Layer of Switchable Water Solubility

Scalable Imprinting of Shape-Specific Polymeric Nanocarriers Using a Release Layer of Switchable Water Solubility

Fabrication of self-aligned multilevel nanostructures

Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes

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