2016
DOI: 10.1115/1.4033742
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Mechanics-Based Approach for Detection and Measurement of Particle Contamination in Proximity Nanofabrication Processes

Abstract: In spite of the great progress made toward addressing the challenge of particle contamination in nanomanufacturing, its deleterious effect on yield is still not negligible. This is particularly true for nanofabrication processes that involve close proximity or contact between two or more surfaces. One such process is Jet-and-Flash Imprint Lithography (J-FIL™), which involves the formation of a nanoscale liquid film between a patterned template and a substrate. In this process, the presence of any frontside par… Show more

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Cited by 2 publications
(1 citation statement)
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“…6(b). Because the template is fairly rigid, the resulting exclusion zone caused by a particle can have diameter of the order of one thousand times that of the particle itself [27], so the particle that caused this specific void was probably of the order of 3 lm in size. As seen in Fig.…”
Section: Resultsmentioning
confidence: 99%
“…6(b). Because the template is fairly rigid, the resulting exclusion zone caused by a particle can have diameter of the order of one thousand times that of the particle itself [27], so the particle that caused this specific void was probably of the order of 3 lm in size. As seen in Fig.…”
Section: Resultsmentioning
confidence: 99%