1996
DOI: 10.1149/1.1836415
|View full text |Cite
|
Sign up to set email alerts
|

Ultraviolet Depth Lithography and Galvanoforming for Micromachining

Abstract: LPDs, and {111} facets after a 10 mm treatment in boiling water is observed by AFM, light scattering, and MIR-FTIR measurements. This anisotropic etching is found to be suppressed by decreasing OW concentration. A treatment in HC1-spiked boiling water yields a surface which is comparable with that for room temperature water treatment.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
18
0
1

Year Published

1997
1997
2021
2021

Publication Types

Select...
8
2

Relationship

0
10

Authors

Journals

citations
Cited by 46 publications
(19 citation statements)
references
References 0 publications
0
18
0
1
Order By: Relevance
“…During the last decades the number of commercial applications is still continuously increasing. By example, photopolymer applications are found in electronic materials [14], printing materials [15], optical and electro-optical materials [1617], fabrication of devices and materials [18], adhesives and sealants [19], coatings [20] and surface modifications [2122]. …”
Section: Introductionmentioning
confidence: 99%
“…During the last decades the number of commercial applications is still continuously increasing. By example, photopolymer applications are found in electronic materials [14], printing materials [15], optical and electro-optical materials [1617], fabrication of devices and materials [18], adhesives and sealants [19], coatings [20] and surface modifications [2122]. …”
Section: Introductionmentioning
confidence: 99%
“…Some research into alternative materials has begun, e.g., a NiCo alloy of 79/21 has been reported with relative permeability of 19.4. 13 Another alloy that has been reported in the literature is NiFeMo. 14,15 The original bath was reported in 1965, 14 and only investigated films up to hundreds of angstroms in thickness.…”
mentioning
confidence: 99%
“…It should be noted that although the above example shows the ability of synthesis of unidirectionally aligned uniformly sized PZT nanorod arrays, sol electrophoretic deposition can be easily combined with deep X-ray Lithography [49,50] and soft lithography [51,52] to create various desired PZT patterns in both micro-and meso-scales. With sol electrophoretic deposition, the feature size of a pattern can be as small as a few tens nanometers and the aspect ratio can be at least above 1000.…”
Section: Unidirectional Nanorodsmentioning
confidence: 99%