2010
DOI: 10.1116/1.3359608
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Two step optimized process for scanning tunneling microscopy tip fabrication

Abstract: Fabrication of ultrasharp tips for scanning tunneling microscopy is inherently a two-step procedure, typically involving an etch process and postetch cleaning. From the myriad of etching parameters available in literature a procedure is presented that allows quantitative optimization and the routine production of tips with 3–10 nm radius of curvature. These ideally shaped tips require final oxide removal. Utilizing a custom designed e-beam heater element, oxide removal without localized melting is realized.

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Cited by 11 publications
(4 citation statements)
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“…However, the optimization of the process parameters for reproducibility and tip form/shape regulation is a concern. The latest attempts have come in the form of a basic electrochemical “drop-off” process to optimize tip manufacturing [ 21 ]. In this work, we have produced tips on three different electrochemical etching techniques which are AC, Meniscus and DC etching methods and also have produced some specific samples on each method as shown below in the experimental results.…”
Section: Resultsmentioning
confidence: 99%
“…However, the optimization of the process parameters for reproducibility and tip form/shape regulation is a concern. The latest attempts have come in the form of a basic electrochemical “drop-off” process to optimize tip manufacturing [ 21 ]. In this work, we have produced tips on three different electrochemical etching techniques which are AC, Meniscus and DC etching methods and also have produced some specific samples on each method as shown below in the experimental results.…”
Section: Resultsmentioning
confidence: 99%
“…The new trapping scheme requires nanometre-sized electrodes, readily available in the form of ultra-sharp STM tips. In [44], for instance, the authors present a two-step procedure for the routine production of ultra-sharp STM tips with a radius of curvature ranging from 3 to 10 nm. Even sharper electrodes with a tip radius of 1 nm are presented in [45].…”
Section: Electrodesmentioning
confidence: 99%
“…Systematic studies of tip etching parameters have been mostly limited to nonmagnetic W, whose electrochemistry differs notably from that of Cr. [13][14][15] A major practical advantage of bulk Cr tips is that they circumvent the need for complex ultra-high vacuum (UHV) cleaning and evaporation procedures, as well as in-situ tip exchange. However, the magnetic samples so far used to quantify spin polarization, e.g.…”
Section: Introductionmentioning
confidence: 99%