2018
DOI: 10.1038/s41467-018-05397-w
|View full text |Cite
|
Sign up to set email alerts
|

Two-dimensional multibit optoelectronic memory with broadband spectrum distinction

Abstract: Optoelectronic memory plays a vital role in modern semiconductor industry. The fast emerging requirements for device miniaturization and structural flexibility have diverted research interest to two-dimensional thin layered materials. Here, we report a multibit nonvolatile optoelectronic memory based on a heterostructure of monolayer tungsten diselenide and few-layer hexagonal boron nitride. The tungsten diselenide/boron nitride memory exhibits a memory switching ratio approximately 1.1 × 106, which ensures ov… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

3
215
0

Year Published

2018
2018
2020
2020

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 232 publications
(226 citation statements)
references
References 44 publications
3
215
0
Order By: Relevance
“…Each cycle includes 1) programming, 2) off-current reading, 3) erasing, and 4) on-current reading processes. [14,[28][29][30][31] Under this V DS-pro pulse bias, the I DS abruptly increased to ≈10 −3 A ((1) in Figure 1c). Owing to the intrinsically n-doped MoS 2 (see Section S5, Supporting Information), the channel exhibited reasonably high conductance, I DS ≈ 5 × 10 −10 A with V DS-read = 0.5 V in the dark.…”
Section: Optical Memorymentioning
confidence: 99%
See 3 more Smart Citations
“…Each cycle includes 1) programming, 2) off-current reading, 3) erasing, and 4) on-current reading processes. [14,[28][29][30][31] Under this V DS-pro pulse bias, the I DS abruptly increased to ≈10 −3 A ((1) in Figure 1c). Owing to the intrinsically n-doped MoS 2 (see Section S5, Supporting Information), the channel exhibited reasonably high conductance, I DS ≈ 5 × 10 −10 A with V DS-read = 0.5 V in the dark.…”
Section: Optical Memorymentioning
confidence: 99%
“…Accordingly, the initial current ratio decreases 2000 times to ≈500 after 3.6 × 10 4 s. The long retention time of our device can be ascribed to the large electron barrier of MoS 2 /h-BN (≈2.7 eV), [9] which suppresses electron tunneling between the MoS 2 channel and floating graphene. [30,36] We further investigated the pulse power-dependent photoresponse memory at 458 nm with a fixed exposure time of 1 s, as shown in Figure 3b (638 nm in Figure S6a, Supporting Information). Each P/E cycle includes programming by a negative V DS-pro pulse (−12 V, 0.2 s), off-current reading for 0.5 s, erasing by a 458 nm light pulse (400 nW, 0.4 s), and on-current reading for 0.5 s. The current was measured at V DS = 0.5 V. The largely unchanged on-and off-current after 10 4 P/E cycles indicates the high durability and stability of the MoS 2 /h-BN/graphene memory.…”
Section: Optical Memorymentioning
confidence: 99%
See 2 more Smart Citations
“…Moreover, mixed phase (2H and 1T) hybrid materials which possess semiconducting and metallic region, the Al/1T@2H-MoS 2 -PVP/ITO/PET showed WORM memory effect due to the internal electric field which protects the trapped electrons from being detrapped. [118] Controlling the polarity of the backgate enabled the programming and erasing process under light illumination. [25,[112][113][114] The memory performance of MoS 2 composite-based ReRAM is summarized ( Table 2).…”
Section: Tmd-related Composites and Heterojunction-based Memorymentioning
confidence: 99%