Titanium oxide thin films deposited by high-power impulse magnetron sputtering

Konstantinidis, Stéphanos; Dauchot, J. P.; Hecq, M.

doi:10.1016/j.tsf.2006.07.089

Cited by 147 publications

(98 citation statements)

References 14 publications

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“…Konstantinidis et al [14] presented similar results, showing that rutile phase TiO 2 films could be grown without external heating which is normally required. Sarakinos et al [15] deposited TiO 2 films from a ceramic TiO 1.8 target at fixed pressure and fixed average current and varied the frequency (4 kHz maximum) and found that for all frequencies used, the deposition rate of the film growth is higher compared to the rates achieved for films grown by DCMS.…”

Section: Introductionmentioning

confidence: 72%

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Aiempanakit

Helmersson

Aijaz

et al. 2011

Surface and Coatings Technology

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The effect of peak power in a high power impulse magnetron sputtering (HiPIMS) reactive deposition of TiO 2 films has been studied with respect to the deposition rate and coating properties. With increasing peak power not only the ionization of the sputtered material increases but also their energy. In order to correlate the variation in the ion energy distributions with the film properties, the phase composition, density and optical properties of the films grown with different HiPIMS-parmeters have been investigated and compared to a film grown using direct current magnetron sputtering (DCMS). All experiments were performed for constant average power and pulse on time (100W and 35 μs, respectively), different peak powers were achieved by varying the frequency of pulsing. Ion energy distributions for Ti and O and its dependence on the process conditions have been studied. It was found that films with the highest density and highest refractive index were grown under moderate HiPIMS conditions (moderate peak powers) resulting in only a small loss in massdeposition rate compared to DCMS. It was further found that TiO 2 films with anatase and rutile phases can be grown at room temperature without substrate heating and without postdeposition annealing.

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Section: Introductionmentioning

confidence: 72%

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Aiempanakit

Helmersson

Aijaz

et al. 2011

Surface and Coatings Technology

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show abstract

“…A typical example of a reactively synthesized material system in which HiPIMS can be used to control the phase composition is TiO 2 . 11,[113][114][115][116] In general, TiO 2 films can grow in an amorphous and in two tetragonal crystalline structures; the rutile and the anatase phases, respectively. 117 The anatase phase exhibits interesting photocatalytic properties, 117 whereas the rutile phase exhibits one of the highest refractive indices in nature.…”

Section: B Phase Composition Tailoring By Hipimsmentioning

confidence: 99%

“…118 When HiPIMS is used, the rutile phase can be achieved even at room temperature, and the increase of the flux of energetic species toward the growing film favors the formation of the rutile at the expense of the anatase phase. 11,[113][114][115] This can be, for instance, achieved by increasing the peak target power (or current) 115,116 (see Fig. 9) or by decreasing the working pressure during deposition.…”

Section: B Phase Composition Tailoring By Hipimsmentioning

confidence: 99%

“…7 The high degree of ionization of the sputtered species has been shown to lead to the growth of smooth and dense elemental films 8 as well as reactively deposited compound films 9,10 and enable control over their phase composition, 11 microstructure, 12 as well as mechanical 13 and optical 9,11 properties. It has also been reported to be beneficial in terms of improving film adhesion, 14 enabling deposition of uniform films on complex-shaped substrates, 15,16 and having a decreased deposition temperature.…”

Section: Introductionmentioning

confidence: 99%

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An introduction to thin film processing using high-power impulse magnetron sputtering

2012

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High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized physical vapor deposition technique and is already making its way to industrial applications. The major difference between HiPIMS and conventional magnetron sputtering processes is the mode of operation. In HiPIMS the power is applied to the magnetron (target) in unipolar pulses at a low duty factor (andlt;10%) and low frequency (andlt;10 kHz) leading to peak target power densities of the order of several kilowatts per square centimeter while keeping the average target power density low enough to avoid magnetron overheating and target melting. These conditions result in the generation of a highly dense plasma discharge, where a large fraction of the sputtered material is ionized and thereby providing new and added means for the synthesis of tailor-made thin films. In this review, the features distinguishing HiPIMS from other deposition methods will be addressed in detail along with how they influence the deposition conditions, such as the plasma parameters and the sputtered material, as well as the resulting thin film properties, such as microstructure, phase formation, and chemical composition. General trends will be established in conjunction to industrially relevant material systems to present this emerging technology to the interested reader.Funding Agencies|Swedish Research Council (VR)|623-2009-7348

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“…As such HiPIMS has been frequently utilized for the deposition of metal nitrides such as Al-N, [6] Cr-N, [7][8][9] Ti-N, [10] Nb-N, [11] etc. and metal oxide thin films such as TiO 2 , [12,13] Al 2 O 3 , [14,15] ZnO, [16] ZrO 2 , [17] and Fe 2 O 3 . [18,19] In these studies, it was observed that the properties of films deposited using reactive HiPIMS are superior.…”

Section: Introductionmentioning

confidence: 99%

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Tayal

Gupta

et al. 2015

Surface and Coatings Technology

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In this work, we studied phase formation, structural and magnetic properties of iron-nitride (Fe-N) thin films deposited using high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (dc-MS). The nitrogen partial pressure during deposition was systematically varied both in HiPIMS and dc-MS. Resulting Fe-N films were characterized for their microstructure, magnetic properties and nitrogen concentration. We found that HiPIMS deposited Fe-N films show a globular nanocrystalline microstructure and improved soft magnetic properties. In addition, it was found that the nitrogen reactivity impedes in HiPIMS as compared to dc-MS. Obtained results can be understood in terms of distinct plasma properties of HiPIMS.

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Titanium oxide thin films deposited by high-power impulse magnetron sputtering

Cited by 147 publications

References 14 publications

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

An introduction to thin film processing using high-power impulse magnetron sputtering

Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

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