Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Tayal, Akhil; Gupta, Mukul; Gupta, Ajay; Ganesan, V.; Behera, Layanta; Singh, Surendra; Basu, S.

doi:10.1016/j.surfcoat.2015.05.008

Cited by 35 publications

(11 citation statements)

References 62 publications

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“…2 However, in a plasma based synthesis method, typically that are found in physical vapor deposition, increased ratio of nitrogen ions may assist the formation of some phases that do not exist in the bulk. Iron mononitride (FeN) is one such compound, which has been deposited frequently using reactive magnetron sputtering [3][4][5][6][7][8][9][10] and recently using nitrogen plasma assisted molecular beam epitaxy. 11 Theoretical studies suggest that the enthalpy of formation (∆H • f ) for FeN 12 is about -45 kJ mol −1 which is considerably higher (less negative) than that of early TM mononitrides e.g.…”

Section: Introductionmentioning

confidence: 99%

Self-diffusion processes in stoichiometric iron mononitride

Tayal

Pandey

Reddy

et al. 2021

Journal of Applied Physics

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In this work, we studied atomic self-diffusion and structural phase transformation in a single phase iron mononitride (FeN) thin film deposited at an optimized substrate temperature (T s ) of 423 K. At this T s , FeN film exhibit a tetrahedral coordination between Fe and N atoms (ZnS-type structure with lattice parameter of 4.28Å). The structure of FeN film was studied by combining x-ray diffraction with Fe and N K-edge x-ray absorption spectroscopy and conversion electron Mössbauer spectroscopy measurements. Selfdiffusion of Fe and N was measured using secondary ion mass spectroscopy depth profiling in trilayer structures: [FeN(50 nm)/ 57 FeN(2 nm)/FeN(50 nm)] and [FeN(50 nm)/Fe 15 N(2 nm)/FeN(50 nm)] deposited on an amorphous quartz substrate using reactive magnetron sputtering. It was found that atomic self-diffusion is strongly associated with the thermal stability. Before reaching the phase decomposition temperature, the self-diffusion of N was found to be slower than Fe. Upon phase decomposition, both Fe and N diffuse rapidly, and at this stage, the self-diffusion of N takes over Fe. Within the thermally stable state, slower N diffusion indicates that Fe-N bonds are stronger than Fe-Fe bonds in FeN. This behavior was predicted theoretically and has been evidenced in this work.

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Section: Introductionmentioning

confidence: 99%

Self-diffusion processes in stoichiometric iron mononitride

Tayal

Pandey

Reddy

et al. 2021

Journal of Applied Physics

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“…FeN compounds were extensively studied by Schaff et al [23][24][25][26] in late 1990s. Subsequently, FeN thin films were synthesized using ion beam sputtering [27], dc/rf magnetron sputtering [28][29][30][31][32][33][34][35][36][37][38], pulsed laser deposition (PLD) [39][40][41][42], high power impulse magnetron sputtering [43], nitrogen plasma assisted molecular beam epitaxy (MBE) [44][45][46][47][48] and very recently under HPHT [12,16,[49][50][51]. From applications points of view, the mononitride FeN is also very interesting as its oxidation resistance makes it a effective catalyst in chemical reactions [52,53], it can be used as a precursor to yield magnetic phases in a controlled way [38,44,54,55] and also in biomedical applications [17].…”

Section: Introductionmentioning

confidence: 99%

In-situ growth of iron mononitride thin films studied using x-ray absorption spectroscopy and nuclear resonant scattering

et al. 2019

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We studied the structural and magnetic properties of in-situ grown iron mononitride (FeN) thin films. Initial stages of film growth were trapped utilizing synchrotron based soft x-ray absorption near edge spectroscopy (XANES) at the N K-edge and nuclear resonant scattering (NRS). Films were grown using dcmagnetron sputtering, separately at the experimental stations of SXAS beamline (BL01, Indus 2) and NRS beamline (P01, Petra III). It was found that the initial stages of film growth differs from the bulk of it. Ultrathin FeN films, exhibited larger energy separation between the t 2g and e g features and an intense e g feature in the N K-edge pattern. This indicates that a structural transition is taking place from the rock-salt (RS)-type FeN to zinc-blende (ZB)-type FeN when the thickness of films increases beyond 5 nm. The behavior of such N K-edge features correlates very well with the emergence of a magnetic component appearing in the NRS pattern at 100 K in ultrathin FeN films. Combining the in-situ XANES and NRS measurements, it appears that initial FeN layers grow in a RS-type structure having a magnetic ground state. Subsequently, the structure changes to ZB-type which is known to be non-magnetic. Observed results help in resolving the long standing debate about the structure and the magnetic ground state of FeN.

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“…TiN and CrN are commonly used and well-studied hard coating materials [31,[35][36][37]. Fe-nitrides are less commonly used as hard coatings, although a limited number of studies have been conducted to examine their synthesis and mechanical properties [38][39][40]. Although films of nickel nitrides have been synthesized and studied [41,42], Ni has little affinity for nitrogen and as a poor nitride former, has limited commercial potential.…”

Section: Discussionmentioning

confidence: 99%

The Effects of Ti Additions and Deposition Parameters on the Structural and Mechanical Properties of Stainless Steel-Nitride Thin Films

Alresheedi

Krzanowski

2019

Coatings

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This study examines the structure and properties of stainless steel coatings deposited to incorporate large concentrations of nitrogen along with varying amounts of titanium. Deposition was carried out using magnetron co-sputtering of stainless steel and titanium from separate targets in a mixed Ar/N2 gas atmosphere. Composition analysis by X-ray photoelectron spectroscopy showed that while films with up to 4 at.% Ti exhibited little change in nitrogen content (compared to films deposited without Ti) and remained sub-stoichiometric with respect to N content. Films with 7–8 at.% Ti had a higher N level and further increasing the Ti level to 11–12 at.% resulted in stoichiometric N levels. X-ray diffraction showed that the films all had a nominally FCC structure with no additional phases. However, the peak locations for the (111) and (200) reflections indicated a distorted lattice characteristic of the S-phase, with calculated c/a values ranging from 1.007 to 1.033. The Ti additions, along with the corresponding increase in N content, helped reduce the extent of lattice distortion. The film microstructure of the higher (11–12 at.%) Ti films also showed higher density, lower surface roughness, and a finer grain structure. As a result, these films had a higher hardness compared to the sub-stoichiometric films, with hardness levels in the range of 18–23 GPa, typical of transition metal nitrides coatings.

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Study of magnetic iron nitride thin films deposited by high power impulse magnetron sputtering

Cited by 35 publications

References 62 publications

Self-diffusion processes in stoichiometric iron mononitride

Self-diffusion processes in stoichiometric iron mononitride

In-situ growth of iron mononitride thin films studied using x-ray absorption spectroscopy and nuclear resonant scattering

The Effects of Ti Additions and Deposition Parameters on the Structural and Mechanical Properties of Stainless Steel-Nitride Thin Films

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