2000
DOI: 10.1016/s0924-4247(99)00339-8
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Through-etched silicon carriers for passive alignment of optical fibers to surface-active optoelectronic components

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Cited by 15 publications
(9 citation statements)
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“…Passive self-centering of the fiber during its insertion can be achieved using symmetrical spring structures. 10 It is this approach that we will pursue in this section: we will design and optimize the spring structures to achieve robust self-centering of the fiber while targeting low-cost high-volume fabrication in plastics.…”
Section: Design and Simulation Of Self-centering Fiber Alignment Strumentioning
confidence: 99%
“…Passive self-centering of the fiber during its insertion can be achieved using symmetrical spring structures. 10 It is this approach that we will pursue in this section: we will design and optimize the spring structures to achieve robust self-centering of the fiber while targeting low-cost high-volume fabrication in plastics.…”
Section: Design and Simulation Of Self-centering Fiber Alignment Strumentioning
confidence: 99%
“…Passive self-centering of the fiber during its insertion can be achieved using symmetrical spring structures. 9 It is this approach that we will pursue in this section: we will design and optimize the spring structures to achieve robust self-centering of the fiber while targeting low-cost high-volume fabrication in plastics.…”
Section: Design and Simulation Of Self-centering Fiber Connector Strumentioning
confidence: 99%
“…We also wish to achieve a sidewall angle near 90º or with a slight positive taper in order to precisely align the fiber with respect to the vertical J-coupler. The Bosch process is commonly used to fabricate deeply etched vias that possess high aspect ratio and anisotropy [15][16][17][18]. This process is illustrated schematically in fig.…”
Section: Through-wafer Etchmentioning
confidence: 99%
“…In order to realize the fabrication of this device, which requires a smoothly contoured, three-dimensional profile, we have developed a grayscale lithography process based on high energy beam sensitive (HEBS) glass [10][11][12][13][14]. We have also developed high speed plasma etching capability based on deep reactive ion etching (DRIE) [15][16][17][18] to achieve a throughwafer etch process for mechanically securing and aligning the optical fiber underneath the parabolic mirror.…”
Section: Introductionmentioning
confidence: 99%