“…Germanium (Ge) is a critical optical material due to its high charge-carrier mobility, high absorption coefficient, with a low energy bandgap (0.66 eV), which allows for absorption in a wide wavelength range up to ∼1800 nm. The interest in Ge architecture stems from the fact that Ge optical components are used in thermal imaging, CO 2 lasers, night vision systems, and various other applications such as image sensors, photodetectors, and solar cells. − This includes multijunction as well as single-junction solar cells − and photovoltaic systems. , To incorporate Ge in the silicon technology, there has been a lot of effort to grow high quality Ge thin films on Si substrates using low cost and temperature deposition techniques. − However, it is challenging due to incompatibility with conventional CMOS processes. Multiple issues, such as strained films due to the lattice-mismatch and high surface roughness discontinuous growth, have hindered Ge-based devices on Si. − …”