2013
DOI: 10.1038/am.2013.29
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Thin-film metal oxides in organic semiconductor devices: their electronic structures, work functions and interfaces

Abstract: Thin-film metal oxides are among the key materials used in organic semiconductor devices. As there are no intrinsic charge carriers in a typical organic semiconductor, all charges in the device must be injected from electrode/organic interfaces, whose energetic structure consequentially dictates the performance of devices. The energy barrier at the interface depends critically on the work function of the electrode. For this reason, various types of thin-film metal oxides can be used as a buffer layer to modify… Show more

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Cited by 350 publications
(324 citation statements)
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References 224 publications
(200 reference statements)
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“…We attribute this low value to the presence of anionic electrons existing at interstitial positions without belonging to specific orbitals of the structure's ions (27). The work function of a-ZSO (3.5 eV) is significantly lower than that of typical transparent oxide semiconductors (20,28) including ZnO (4.3eV), as is summarized in Fig. 2C.…”
Section: Resultsmentioning
confidence: 91%
See 1 more Smart Citation
“…We attribute this low value to the presence of anionic electrons existing at interstitial positions without belonging to specific orbitals of the structure's ions (27). The work function of a-ZSO (3.5 eV) is significantly lower than that of typical transparent oxide semiconductors (20,28) including ZnO (4.3eV), as is summarized in Fig. 2C.…”
Section: Resultsmentioning
confidence: 91%
“…Metal oxide thin films are attractive as carrier injection/transport layers (20). In particular, transparent amorphous oxide semiconductors are very favorable due to their process compatibility, chemical stability, optical transparency, and wide tunability of various relevant properties (21).…”
Section: Materials Designmentioning
confidence: 99%
“…Another feature of the studied TMOs is their peculiarly large work function (Φ TMO ) and how it changes as a result of redox environments, contamination by adsorbates and chemical interaction with adjacent interfaces [27]. In this sense, the Φ TMO values after thermal evaporation will be several meV smaller than those of in-situ metal oxidation.…”
Section: Properties Of Transition Metal Oxidesmentioning
confidence: 98%
“…Such n-type semiconductivity generates from intrinsic oxygen vacancies in their atomic structure (i.e. Oxidation state transitions and generation of states within the E gap have been reported as characteristic features of oxygen loss during TMO deposition [27]. In order to identify such vacancy-related effects, the XPS photoemission spectra were analyzed.…”
Section: Properties Of Transition Metal Oxidesmentioning
confidence: 99%
“…[181,182] Figure 4. a) Silicon heterojunction (SHJ) solar cell structure and b) zoom-in of the front TCO layer indicating the 1. metal/TCO interface, 2. bulk and 3.…”
Section: Progress Reportmentioning
confidence: 99%