2009
DOI: 10.1063/1.3110075
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Thermal emittance and response time measurements of a GaN photocathode

Abstract: We present the measurements of thermal emittance and response time for a GaN photocathode illuminated with 5 ps pulses at 260 nm wavelength. The thermal emittance was measured downstream of a 100 kV dc gun using a solenoid scan with a wire scanner and a beam viewscreen and was found to be 1.35Ϯ 0.11 mm mrad normalized rms emittance per 1 mm rms of illuminated spot size. The response time of the photoemitted electrons was evaluated using a deflecting mode rf cavity synchronized to the laser pulses and was found… Show more

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Cited by 37 publications
(27 citation statements)
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“…[1][2][3][4][5][6][7] GaN is known as the third generation semiconductor after Si and GaAs. Negative electron affinity ͑NEA͒-based GaN photocathode has a superior performing high quantum efficiency ͑QE͒, low dark current, and concentrative emitting electron energy distribution.…”
mentioning
confidence: 99%
“…[1][2][3][4][5][6][7] GaN is known as the third generation semiconductor after Si and GaAs. Negative electron affinity ͑NEA͒-based GaN photocathode has a superior performing high quantum efficiency ͑QE͒, low dark current, and concentrative emitting electron energy distribution.…”
mentioning
confidence: 99%
“…This requirement increases the complexity, mass, and volume of the spectrometer in such applications. The recent progress in high-quantum-efficiency GaN photocathodes 7 and systematic study of temporal emission response with hot carrier relaxation mechanisms involved in GaN photocathodes 8 has established IIInitride photocathodes as a promising candidate for UV low signal photodetection. The small electron affinity of GaN allows the development of highquantum-efficiency negative-electron-affinity (NEA) photocathodes with significant advantages such as solar blindness, radiation hardness, and low noise.…”
Section: Introductionmentioning
confidence: 99%
“…These issues remain even though aggressive and substantial efforts have been undertaken to reduce the MTE that figures prominently in the emittance figure of merit. Efforts include minimizing uncorrelated emittance growth affected by space charge forces through beam shaping of the initial distribution 11 (thereby requiring photocathode response times smaller than a picosecond) 25 , increasing the pulse length so as to enable smaller laser spot sizes 26 , altering the degree of band bending at the surface of a semiconductor photocathode such as GaN so as to limit scattering effects and the randomization of momentum gain near the surface 26 , and controlling the surface roughness by improving the surface preparation procedures in III-V NEA photocathodes 27,28 .…”
Section: Introductionmentioning
confidence: 99%