2011
DOI: 10.1007/s11664-010-1507-7
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Novel Cs-Free GaN Photocathodes

Abstract: We report on a novel GaN photocathode structure that eliminates the use of Cs for photocathode activation. Development of such a photocathode structure promises reduced cost and complexity of the device, potentially with stable operation for a longer time. Device simulation studies suggest that deposition of Si delta-doped GaN on p-GaN templates induces sharp downward energy band bending at the surface, assisting in achieving effective negative electron affinity for GaN photocathodes without the use of Cs. A s… Show more

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Cited by 16 publications
(3 citation statements)
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“…The bandgaps of the large-diameter nanowires were reduced to 2.40 and 0.74 eV, respectively, after the introduction of the n-type capping layer. Device simulation studies [15] have shown that deposition of an n-type doped layer on a p-GaN template induces downward band bending at the surface, contributing to an efficient negative electron affinity for GaN photocathodes without the use of Cs. Herein, we only analyze the total density of states (DOS) and partial density of states (PDOS) of GaN nanowires after covering with an n-type capping layer.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…The bandgaps of the large-diameter nanowires were reduced to 2.40 and 0.74 eV, respectively, after the introduction of the n-type capping layer. Device simulation studies [15] have shown that deposition of an n-type doped layer on a p-GaN template induces downward band bending at the surface, contributing to an efficient negative electron affinity for GaN photocathodes without the use of Cs. Herein, we only analyze the total density of states (DOS) and partial density of states (PDOS) of GaN nanowires after covering with an n-type capping layer.…”
Section: Resultsmentioning
confidence: 99%
“…[ 13 ] These limitations of using cesium diminish the advantages offered by GaN material systems. Recently, work has been reported to achieve high quantum efficiency GaN photocathodes without cesiumization by using the n‐type capping layer, [ 14,15 ] as shown in Figure 1b. The built‐in field in the Ga‐polar (0001) growth direction [ 16 ] allows modification of the band structure inside the GaN material, leading to the design of photocathode devices.…”
Section: Introductionmentioning
confidence: 99%
“…The magnitude of polarization charge is dependent on the polar angle, with the largest out of plane polarization charge for c-plane III-nitrides [14]. Ga-polar p-type GaN photocathodes have previously been studied both with the use of a Cs-activation layer [15] and with novel Cs-free architectures employing a Si delta-doped surface layer [16]. The Si delta-doped layer and thin n+GaN cap required to stabilize the surface creates a narrow depletion region and increases downward surface band bending.…”
Section: The N-polar Gan Photocathode Structurementioning
confidence: 99%