2008 IEEE International Integrated Reliability Workshop Final Report 2008
DOI: 10.1109/irws.2008.4796097
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The Origins of Random Telegraph Noise in Highly Scaled SiON nMOSFETs

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Cited by 17 publications
(25 citation statements)
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“…In recent years, random telegraph noise (RTN) has attracted researchers' attention. RTN can cause random fluctuations in electrical parameters (such as V th and I d ) [1]. RTN-induced I d variation can be up to 40% in 30×30nm devices [2], and the V th variation can be larger than 70mV for the smallest devices at 22nm technology node [3].…”
Section: Introductionmentioning
confidence: 99%
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“…In recent years, random telegraph noise (RTN) has attracted researchers' attention. RTN can cause random fluctuations in electrical parameters (such as V th and I d ) [1]. RTN-induced I d variation can be up to 40% in 30×30nm devices [2], and the V th variation can be larger than 70mV for the smallest devices at 22nm technology node [3].…”
Section: Introductionmentioning
confidence: 99%
“…The physical mechanism of RTN has been studied for many years [1], [6]- [8]. The impact of single trap induced RTN on memories was widely studied [4], [9]- [15], some circuitlevel simulation approaches were also proposed [16]- [19].…”
Section: Introductionmentioning
confidence: 99%
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“…As a result, it is important to investigate electronic noise in semiconductor devices. Electronic noise is due to random events that take place inside electrical devices and the theoretical interpretation of these stochastic events is very important in order to accurately match a noise model to the observed results in experimental studies [1].In this paper we present a deterministic approach to compute the spatial origin of current noise spectral density in semiconductor devices. The numerical solution of it is based on the spherical harmonics expansion (SHE) of the Boltzmann Transport Equation (BTE) in the frequency domain with special initial [2] and boundary conditions [3].…”
mentioning
confidence: 99%