2009
DOI: 10.1007/s10854-009-9996-y
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The influence of rapid thermal annealing on electrical and structural properties of Pt/Au Schottky contacts to n-type InP

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Cited by 5 publications
(5 citation statements)
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“…The I – V curve of the device shows a rectification effect ( Figure 2 a,b ), indicating a typical Schottky contact formed between InP NW and Pt. [ 25 ] A photovoltaic effect was observed under the light illumination from a solar simulator with a short circuit current ( I SC ) of 136 nA and an open circuit voltage ( V OC ) of 80 mV, which was the foundation of further self‐powered sensing operation [ 26 ] with the I SC acting as the self‐powered sensing signal.…”
Section: Methodsmentioning
confidence: 99%
“…The I – V curve of the device shows a rectification effect ( Figure 2 a,b ), indicating a typical Schottky contact formed between InP NW and Pt. [ 25 ] A photovoltaic effect was observed under the light illumination from a solar simulator with a short circuit current ( I SC ) of 136 nA and an open circuit voltage ( V OC ) of 80 mV, which was the foundation of further self‐powered sensing operation [ 26 ] with the I SC acting as the self‐powered sensing signal.…”
Section: Methodsmentioning
confidence: 99%
“…The efforts have been made to improve Schottky barrier heights by several research groups [4][5][6][7][8][9][10][11][12]. For example, Eftekhari [4] investigated the effect of rapid thermal annealing (RTA) on the electrical properties of Ni and Pd contacts on n-InP.…”
Section: Introductionmentioning
confidence: 99%
“…Cetin and Ayyildiz [5] prepared Au, Al and Cu Schottky contacts on InP surfaces and studied the influence of the air-grown oxide on the electrical performance. Bhaskar Reddy et al [6] studied the influence of rapid thermal annealing (RTA) on the electrical and structural properties of Pt/Au Schottky contacts to n-InP. They reported that the maximum barrier height was obtained (0.51 eV (I-V)/0.89 eV (C-V)) for the contact annealed at 300°C.…”
Section: Introductionmentioning
confidence: 99%
“…Several metal schemes have been used to form Schottky contacts to n‐type InP in the past 8–20. Some of them were thermally treated and the effects of annealing were studied.…”
Section: Introductionmentioning
confidence: 99%
“…Cetin and Ayyildiz 14 fabricated Au, Al and Cu Schottky diodes on InP surfaces and investigated the influence of the air‐grown oxide on the electrical performance. Bhaskar Reddy et al 15 studied the influence of rapid thermal annealing (RTA) on electrical and structural properties of Pt/Au Schottky contacts to n‐InP and they reported that the maximum barrier height was found to be 0.51 eV [current–voltage ( I – V )] and 0.89 eV [capacitance–voltage ( C – V )] for the contact annealed at 300 °C. They found that the formation of intermetallic compounds at the interface may be the reason for the increase of barrier height after annealing at 300 °C.…”
Section: Introductionmentioning
confidence: 99%