2017
DOI: 10.1149/2.1131707jes
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The Impact of Organic Additives on Copper Trench Microstructure

Abstract: Organic additives are typically used in the pulse electrodeposition of copper (Cu) to prevent void formation during the filling of high aspect ratio features. In this work, the role of bath chemistry as modified by organic additives was investigated for its effects on Cu trench microstructure. Polyethylene glycol (PEG), bis(3-sulfopropyl) disulfide (SPS), and Janus green b (JGB) concentrations were varied in the Cu electrodeposition bath. Results indicated a correlation between the JGB/SPS ratio and the surfac… Show more

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Cited by 15 publications
(8 citation statements)
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“…As expected, the use of the Ni foam porous substrate facilitated higher roughness values, which may further exhibit a positive influence on the electroanalytical characteristics of the electrode, in agreement also with data reported in [45]. In addition, an increase of the roughness factor was noticed in the case of the Cu/Nif electrode, which may be attributed to the Cu electrodeposition procedure which involved an additive-free electrolyte, thus leading to a slightly more porous surface, in agreement with [51].…”
Section: Electrochemical Characterization Of 3d Cu Nanoporous Electrodessupporting
confidence: 88%
“…As expected, the use of the Ni foam porous substrate facilitated higher roughness values, which may further exhibit a positive influence on the electroanalytical characteristics of the electrode, in agreement also with data reported in [45]. In addition, an increase of the roughness factor was noticed in the case of the Cu/Nif electrode, which may be attributed to the Cu electrodeposition procedure which involved an additive-free electrolyte, thus leading to a slightly more porous surface, in agreement with [51].…”
Section: Electrochemical Characterization Of 3d Cu Nanoporous Electrodessupporting
confidence: 88%
“…[56,61,62,68,105]. The interconnects industry has already evolved methods, such as using organic additives, altering electrodeposition parameter, and post-fabrication processing for Cu grain control, which can be borrowed and tested for Cu/CNT preparation [122][123][124][125].…”
Section: Control Cnt and Cu-matrix Attributesmentioning
confidence: 99%
“…(a) Cu/CNT for mainstream electronics: For the electronics industry, electrodeposition-based Cu/ CNT fabrication methods are most compatible. Co-electrodeposition is closest to the current processing technologies used by the electronics industry (damascene process [122][123][124][125]). However, coelectrodeposition entails several Cu/CNT structure control issues that need solving, such as obtaining individually dispersed long CNTs for homogeneous composite fabrication, controlling nanotube alignment, etc.…”
Section: Cu/cnt For Mainstream Applicationsmentioning
confidence: 99%
“…Because additives change the crystal structures of Cu films in general, 45 the change in crystal structures by JGB can affect the surface morphology and deposition rate of Cu. Figure 4 shows the characteristics of the Cu film on the planar substrate with the increasing concentration of JGB at −0.025 V. Figure 4a Figure 5 illustrates the initial stage of chronoamperometry at −0.025 V, which is critical for understanding the nucleation behavior of Cu with the concentration of JGB and agitation conditions.…”
Section: Resultsmentioning
confidence: 99%