The electro-oxidation of water and alcohols at BDD in hexafluoroisopropanol

Ayata, Sevda; Stefanova, Ana; Ernst, Siegfried; Baltruschat, Helmut

doi:10.1016/j.jelechem.2013.03.024

Cited by 20 publications

(14 citation statements)

References 28 publications

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“…The C C bonds have to be cleaved for the formation of CO 2 from the reactants used here, and we conclude, that the OH radicals are necessary to achieve this. This conclusion is supported by our observation, that in HFiP as a solvent, where OH radicals cannot be formed, there is no indication for a C C bond cleavage even at high potentials up to 3 V vs Ag/AgCl, as the oxidation rate for i-propanol is far below the mass transport limit for a 2 electron transfer for the formation of acetone [21]. Thus, the complete oxidation of the reactants in aqueous solutions is only possible above 2.5 V with the participation of OH radicals.…”

Section: Discussionsupporting

confidence: 74%

“…The first one with a direct electron transfer and hydrogen abstraction from a carbon atom (as discussed in Ref. [21] for the oxidation of alcohols in HFiP as a solvent) is the only one at lower potentials without the participation of intermediate OH radicals. In the second one, OH radicals formed at potentials above 2.5 V participate in the reaction.…”

Section: Discussionmentioning

confidence: 99%

“…As a guideline for understanding the different reactivities for hydrogen abstractions at the BDD electrode we can use the trend in the bond dissociation energies (BDE) of the weakest C H bonds (as also discussed in Ref. [21]) and the rate constants for the hydrogen abstraction by OH radicals (cf. Table 7).…”

Section: Discussionmentioning

confidence: 99%

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Mechanistic studies on boron-doped diamond: Oxidation of small organic molecules

Stefanova

Ayata

Erem

et al. 2013

Electrochimica Acta

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Section: Discussionsupporting

confidence: 74%

Section: Discussionmentioning

confidence: 99%

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Mechanistic studies on boron-doped diamond: Oxidation of small organic molecules

Stefanova

Ayata

Erem

et al. 2013

Electrochimica Acta

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“…The oxidative stability of HFIP makes it an ideal solvent for electrochemical investigations. 13 Also, as described below, chemical reactions in highly oxidising environments, such as the hydrogen peroxide epoxidation of olefins, may be conducted in HFIP where other non-fluorinated alcohol solvents would be incompatible. As shown above (Box 1e), when measured using a glassy carbon working electrode, the electrochemical domain of HFIP is greater than that for water, and very comparable to acetonitrile.…”

Section: E) Redox Stabilitymentioning

confidence: 99%

Hexafluoroisopropanol as a highly versatile solvent

et al. 2017

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Hexafluoroisopropanol (HFIP) has recently become a very popular solvent with uses in many different applications; analysis shows that it possesses a wide range of interesting and unique properties. In this Perspective we detail the main uses of HFIP in the natural sciences and disclose the underlying principles that give it such wide appeal. Accordingly, we will show the broad usage and beneficial effects of HFIP in different fields such as organic, inorganic or physical chemistry, chemical biology and polymer science.

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“…14 Furthermore, B-doped diamond films are used as electrochemical 15−17 and corrosion-resistant electrodes for water purification 18 and electro-oxidation purposes, 19,20 electrochemical capacitors for energy storage, 21 as well as biocompatible electrodes for implants. 22,23 Diamond polishing has been investigated thoroughly for about 100 years because of its evident importance in jewelry.…”

Section: Introductionmentioning

confidence: 99%

Effect of Boron Doping on the Wear Behavior of the Growth and Nucleation Surfaces of Micro- and Nanocrystalline Diamond Films

Buijnsters

Tsigkourakos

Hantschel

et al. 2016

ACS Appl. Mater. Interfaces

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Effect of boron doping on the wear behavior of the growth and nucleation surfaces of micro-and nanocrystalline diamond films Buijnsters CopyrightOther than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons. Takedown policyPlease contact us and provide details if you believe this document breaches copyrights. We will remove access to the work immediately and investigate your claim. ABSTRACT: B-doped diamond has become the ultimate material for applications in the field of microelectromechanical systems (MEMS), which require both highly wear resistant and electrically conductive diamond films and microstructures. Despite the extensive research of the tribological properties of undoped diamond, to date there is very limited knowledge of the wear properties of highly B-doped diamond. Therefore, in this work a comprehensive investigation of the wear behavior of highly B-doped diamond is presented. Reciprocating sliding tests are performed on micro-and nanocrystalline diamond (MCD, NCD) films with varying B-doping levels and thicknesses. We demonstrate a linear dependency of the wear rate of the different diamond films with the B-doping level. Specifically, the wear rate increases by a factor of 3 between NCD films with 0.6 and 2.8 at. % B-doping levels. This increase in the wear rate can be linked to a 50% decrease in both hardness and elastic modulus of the highly B-doped NCD films, as determined by nanoindentation measurements. Moreover, we show that fine-grained diamond films are more prone to wear. Particularly, NCD films with a 3× smaller grain size but similar B-doping levels exhibit a double wear rate, indicating the crucial role of the grain size on the diamond film wear behavior. On the other hand, MCD films are the most wear-resistant films due to their larger grains and lower B-doping levels. We propose a graphical scheme of the wear behavior which involves planarization and mechanochemically driven amorphization of the surface to describe the wear mechanism of B-doped diamond films. Finally, the wear behavior of the nucleation surface of NCD films is investigated for the first time. In particular, the nucleation surface is shown to be susceptible to higher wear compared to the growth surface due to its higher grain boundary line density.

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The electro-oxidation of water and alcohols at BDD in hexafluoroisopropanol

Cited by 20 publications

References 28 publications

Mechanistic studies on boron-doped diamond: Oxidation of small organic molecules

Mechanistic studies on boron-doped diamond: Oxidation of small organic molecules

Hexafluoroisopropanol as a highly versatile solvent

Effect of Boron Doping on the Wear Behavior of the Growth and Nucleation Surfaces of Micro- and Nanocrystalline Diamond Films

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