The effect of target-substrate coupling on reactive direct current magnetron sputtering

Schiller, S.; Heisig, U.; Korndörfer, Chr.; Strümpfel, J.; Frach, Peter

doi:10.1016/s0257-8972(89)80016-7

Cited by 13 publications

(2 citation statements)

References 6 publications

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“…The deposition rate of ceramic compounds can be increased by a plasma emission monitoring system [3] which allows a high deposition rate of the coating despite unstable conditions [4,5]. However, it can involve the formation of an oxygen-deficient coating for the higher deposition rates.…”

Section: Introductionmentioning

confidence: 99%

Planar Solid Oxide Fuel Cell: Electrolyte Deposited by Reactive Magnetron Sputtering and Cell Test

2010

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In this work the deposition of a thin YSZ electrolyte layer (< 10 μm) on a porous anode substrate is performed by sputtering Zr–Y metallic targets in argon–oxygen reactive gas mixtures under unstable deposition conditions. A plasma emission monitoring system is used to ensure a high deposition rate of the ceramic film. The deposition parameters are optimised in order to obtain a good compromise between quality, density and deposition rate for coatings realised under unstable conditions.After a short description of the experimental setup, the characterisation of the YSZ coatings is performed using scanning electron microscopy, X‐ray diffraction and permeability measurements. Then a complete cell incorporating a thin YSZ electrolyte layer (6.2 ± 0.3 μm thick) obtained by magnetron sputtering is manufactured and tested. This single planar solid oxide fuel cell exhibits a power density of 560 mW cm–2 under a voltage of 0.7 V at 800 °C and a maximal power density of 660 mW cm–2 is reached.

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Section: Introductionmentioning

confidence: 99%

Planar Solid Oxide Fuel Cell: Electrolyte Deposited by Reactive Magnetron Sputtering and Cell Test

2010

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“…In many applications, the best solution for the long-term stable deposition of stoichiometric films is the stabilization of the reactive working point by reactive gas closed-loop control. 24,25) However, to date, there are as yet no reports on the experimental optimization and stable operation of such a control system for preparing BZT thin films using a Ba metal target. Therefore, the stabilization of the reactive sputtering process that involves a control loop for the reactive gas flow is required.…”

Section: Methodsmentioning

confidence: 99%

Preparation and characterization of Ba(Zr_xTi₁₋_x)O₃thin films for high-frequency applications

Woong

Shima

Yamamoto

et al. 2014

Jpn. J. Appl. Phys.

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Ba(Zr x Ti 1%x )O 3 (BZT) thin films were deposited on a (100)MgO substrate by RF-magnetron reactive sputtering using metal targets. In this paper, a model of the reactive sputtering process using a metal composite target at different reactive gas flow rates is presented. 500-nm-thick BZT thin (x = 0.26) films for high frequency performance showed a single perovskite phase and a high crystallinity on the MgO substrate with only a (001)/ (100) orientation at an optimum reactive gas flow rate in Ar + O 2 . The BZT films had a stoichiometric Ba/Ti ratio and epitaxially grew on the MgO substrate. They showed a dense microstructure without cracks or voids. Their low capacitance and loss tangent showed little dispersion at 1-18 GHz. These results indicated that we succeeded in depositing high-quality and potentially tunable ferroelectric BZT films for high-frequency applications by RF-magnetron reactive sputtering using metal targets.

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Vapor Deposition Processing

Purushothaman

Narayan

Cuomo

1993

Advanced Topics in Materials Science and Engineering

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The effect of target-substrate coupling on reactive direct current magnetron sputtering

Cited by 13 publications

References 6 publications

Planar Solid Oxide Fuel Cell: Electrolyte Deposited by Reactive Magnetron Sputtering and Cell Test

Planar Solid Oxide Fuel Cell: Electrolyte Deposited by Reactive Magnetron Sputtering and Cell Test

Preparation and characterization of Ba(Zr_xTi₁₋_x)O₃thin films for high-frequency applications

Vapor Deposition Processing

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The effect of target-substrate coupling on reactive direct current magnetron sputtering

Cited by 13 publications

References 6 publications

Planar Solid Oxide Fuel Cell: Electrolyte Deposited by Reactive Magnetron Sputtering and Cell Test

Planar Solid Oxide Fuel Cell: Electrolyte Deposited by Reactive Magnetron Sputtering and Cell Test

Preparation and characterization of Ba(ZrxTi1−x)O3thin films for high-frequency applications

Vapor Deposition Processing

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Product

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Preparation and characterization of Ba(Zr_xTi₁₋_x)O₃thin films for high-frequency applications