Planar Solid Oxide Fuel Cell: Electrolyte Deposited by Reactive Magnetron Sputtering and Cell Test

Coddet, Pierre; Péra, Marie‐Cécile; Billard, Alain

doi:10.1002/fuce.201000123

Cited by 17 publications

(10 citation statements)

References 17 publications

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“…These results are slightly lower than those of Coddet et al [32] with a YSZ magnetron sputtering SOFC: they obtained a current density of 800 mA.cm -2 at 700mV for a 6 µm thick YSZ electrolyte but with a even more efficient cathode made in LSC (lanthanum strontium colbaltite). Nevertheless, it can be compared with thin film electrolyte technologies SOFC (100-1000 mA.cm -2 ) but remains lower than SOFC obtained by traditional firing methods (1000-1400 mA.cm -2 ) and has efficiency close to commercial H.C. Starck ESC2 fuel cell (500 mA.cm -2 @700mV).…”

Section: Fuel Cell Testscontrasting

confidence: 59%

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Optimization of DC Reactive Magnetron Sputtering Deposition Process for Efficient YSZ Electrolyte Thin Film SOFC

et al. 2012

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Yttria‐stabilized zirconia (YSZ, ZrO2:Y2O3) thin films were deposited by reactive DC magnetron sputtering with a high deposition rate from a metallic target of Zr/Y in an argon/oxygen atmosphere. Plasma parameters and composition analysis of the gas phase reveal that the sputtering process in the “compound” mode is reached for a 2.5 sccm oxygen flow rate. Deposition onto silicon in “metal” mode at a flow rate close to the transition, allows obtaining at very high deposition rates (>10 μm h–1) a compact columnar stoichiometric crystallized YSZ film. When deposited on NiO‐YSZ commercial anode, the obtained coatings show the same properties. In spite of the complexity of the substrate (roughness and porosity), a compact and conformed layer was formed. Annealing treatments in air or hydrogen do not significantly alter the structure of the layers. Electrochemical test at 850 °C with a screen‐printed LSM (LaSrMnO3) cathode exhibits a satisfying gastightness (OCV = 900 mV) and a maximum power density of 350 mW cm–2.

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Section: Fuel Cell Testscontrasting

confidence: 59%

“…On large-scale SEM images (not shown here), one can note that the porosity of the substrate is locked by the film. Moreover, as reported by Wang [31] and Coddet [32] on AFL coated anode substrate, no obvious intercolumn porosity is evidenced.…”

Section: Coating On Commercial Anodesupporting

confidence: 58%

Optimization of DC Reactive Magnetron Sputtering Deposition Process for Efficient YSZ Electrolyte Thin Film SOFC

et al. 2012

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“…Without a bias voltage, even at a substrate temperature of 800 o C , the film had a columnar microstructure (Figure 2, a). By optimizing the specific power of the bias voltage, the authors managed to form a dense electrolyte without a columnar structure (Figure 2b Coddet et al showed that the combination of DC-pulsed magnetron sputtering at low oxygen flow rates with high-frequency bias on the substrate makes it possible to obtain high-quality dense YSZ films of about 6.2 µm in thickness [30]. The deposition rate of 2.6 µm/h was obtained by sputtering of two (Zr-Y) cathodes.…”

Section: Magnetron Sputtering Of Ysz Electrolyte Effect Of Depositiomentioning

confidence: 99%

“…Comparison of the characteristics of SOFC cells with the YSZ electrolyte, manufactured by various methods [30]. The data were obtained at a temperature of 800 o C and a voltage of 0.7 V.…”

Section: Magnetron Sputtering Of Ysz Electrolyte Effect Of Depositiomentioning

confidence: 99%

Magnetron deposition of yttria-stabilised zirconia electrolyte for solid oxide fuel cells

Solovyev

Шипилова

Работкин

et al. 2018

Eurasian j. phys. funct. mater.

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The aim of the article is to review the latest achievements in the field of magnetron deposition of thinfilm yttria-stabilised zirconia (YSZ) electrolyte for solid oxide fuel cells (SOFC). The main attention is paid to the use of magnetron sputtering for formation of YSZ electrolyte up to 10 µm thick on the anode substrates of intermediate-temperature SOFCs operating at a temperature of (600 − 800) • C . The influence of the types of power sources and such deposition parameters as substrate temperature, substrate bias voltage, post-annealing treatment, etc., as well as the morphology of the anode substrate surface on the microstructure and properties of the deposited electrolyte is analyzed. It is shown that the magnetron sputtering method, despite its relatively high cost and complexity, is applicable to large area SOFC cells and is competitive compared to traditional methods of electrolyte formation, such as tape casting, tape calendering, electrophoretic deposition and screen printing.

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“…tests performed on SOFCs containing magnetron sputtered electrolytes with a columnar structure have shown an electrochemical performance comparable to or worse than cells containing tape cast electrolytes and not a significant improvement as would be expected from the reduced electrolyte thickness [18,19]. This lack of performance is related to leaks in the electrolyte due to the columnar morphology.…”

Section: Introductionmentioning

confidence: 96%

Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering

Sønderby

Aijaz

Helmersson

et al. 2014

Surface and Coatings Technology

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Yttria-stabilized zirconia (YSZ) thin films were reactively sputter-deposited by high power impulse magnetron sputtering (HiPIMS) and pulsed direct current magnetron sputtering (DCMS). The use of substrate bias voltage was studied in both modes of deposition as a process parameter to promote the growth of dense and less columnar films. Films were deposited on both Si(100) and NiO-YSZ fuel cell anodes. The texture, morphology and composition of the deposited films were investigated with regard to their application as thin electrolytes for solid oxide fuel cells (SOFCs). Independent of the deposition mode the films were found to be stoichiometric. The application of substrate bias voltage had opposite effects on texture and crystallinity of films deposited by pulsed DCMS and HiPIMS. Films deposited by pulsed DCMS became highly crystalline and <220> textured at high bias voltage whereas bias applied to HiPIMS deposited films disrupted crystal growth leading to deterioration of crystallinity. Comparing film morphology, it was found that pulsed DCMS films were columnar and contained voids regardless of the applied substrate bias. When depositing by HiPIMS a window of operation at a bias voltage of -25 V to -50 V was found in which it is possible to deposit non-columnar thin films without voids and cracks as desired for SOFC applications.

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Planar Solid Oxide Fuel Cell: Electrolyte Deposited by Reactive Magnetron Sputtering and Cell Test

Cited by 17 publications

References 17 publications

Optimization of DC Reactive Magnetron Sputtering Deposition Process for Efficient YSZ Electrolyte Thin Film SOFC

Optimization of DC Reactive Magnetron Sputtering Deposition Process for Efficient YSZ Electrolyte Thin Film SOFC

Magnetron deposition of yttria-stabilised zirconia electrolyte for solid oxide fuel cells

Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering

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