2021
DOI: 10.1016/j.rinp.2021.104203
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Textured stainless steel foil as efficient rear reflector for flexible black silicon

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Cited by 3 publications
(3 citation statements)
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“…Therefore, an optimal growth temperature of 450 °C was chosen for Si growth, which provided an acceptable antireflection. Of note, the produced b-SS/Fe 3 O 4 /Si templates reached an antireflection performance comparable with that achieved for previously reported b-Si substrates glue-bonded with textured SS [ 27 , 28 ], yet at much lower Si consumption.…”
Section: Resultssupporting
confidence: 85%
See 1 more Smart Citation
“…Therefore, an optimal growth temperature of 450 °C was chosen for Si growth, which provided an acceptable antireflection. Of note, the produced b-SS/Fe 3 O 4 /Si templates reached an antireflection performance comparable with that achieved for previously reported b-Si substrates glue-bonded with textured SS [ 27 , 28 ], yet at much lower Si consumption.…”
Section: Resultssupporting
confidence: 85%
“…Thus, integration of an SS substrate with so-called black materials (e.g., black Si, Si pyramids and vertical nanowire arrays) appears to be a natural solution to achieve high PCE using low-cost supporting substrates. In this light, a very smart but unpractical example of such an integration was demonstrated by Omar et al [ 27 , 28 ] who independently produced a textured rear reflector and b-Si by wet chemistry etching of SS and Si substrates followed by glue bonding. Actually, an increase in light absorption was obtained compared with freestanding b-Si; however, there were no remarks regarding the PCE of the proposed SS/b-Si device.…”
Section: Introductionmentioning
confidence: 99%
“…The wafers are then rinsed using DI H 2 O and dried using nitrogen. To fabricate flexible bSi by one-step MCCE process, silver nanoparticles (Ag NPs) are deposited on the wafers from solution of AgNO 3 :HF:DI H 2 O, in a volumetric ratio of 7:9:34 ml at room temperature for 20 min, followed by a simultaneous etching process (Abouda-Lachiheb et al , 2012; Omar et al , 2021). After the MCCE process, the residuals of Ag catalyst on the surface are removed by etching with HNO 3 (60%) at room temperature.…”
Section: Methodsmentioning
confidence: 99%