Effect of deposition time toward surface morphological and optical properties of silicon dioxide thin films on black silicon by liquid-phase deposition

Sheriff, Muhiddin Ahmad; Hashim, M.R.; Pakhuruddin, Mohd Zamir

doi:10.1007/s00339-022-05832-2

Cited by 1 publication

(1 citation statement)

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“…There are numerous studies of the properties of BS with/without passivation films, but they were typically based on one specific fabrication technique. [27][28][29][30][31][32] In addition, different experimental approaches and technical means have been used in various studies. Therefore, they are less comparative although there are some nice review articles on different BS materials and/or devices trying to put them together.…”

Section: Introductionmentioning

confidence: 99%

Properties of Black Silicon Layers Fabricated by Different Techniques for Solar Cell Applications

Ayvazyan,

Hakhoyan

et al. 2023

Physica Rapid Research Ltrs

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Black silicon (BS) layers coated with passivation films are widely used as antireflective frontal surfaces for solar cells. The most common BS fabrication techniques are reactive ion etching (RIE), metal‐assisted chemical etching, and laser‐induced processing. Herein, the structural and optical properties, as well as the minority carrier lifetime, of BS are compared with and without atomic layer deposited HfO2 passivation films produced by the above formation methods. The antireflection behavior of the samples is discussed based on the light trapping effect and the change in the BS refractive index from air to the bulk of crystalline Si. Finally, test solar cells are manufactured, and their photovoltaic parameters are studied. The comparison results show that RIE is the most preferred in all technical respects. The features of using different BS fabrication techniques from the solar cell manufacturing point of view are analyzed.

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