1995
DOI: 10.1016/0022-0248(95)00224-3
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Te doping with dimethylditelluride during organometallic vapor phase epitaxy of GaAs

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Cited by 9 publications
(3 citation statements)
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“…This is consistent with several studies which report that carrier saturation occurs at concentrations above 10 19 cm À3 [22,23,16], and suggests that there is no formation of a Te-rich second phase in these samples.…”
Section: Resultssupporting
confidence: 93%
See 1 more Smart Citation
“…This is consistent with several studies which report that carrier saturation occurs at concentrations above 10 19 cm À3 [22,23,16], and suggests that there is no formation of a Te-rich second phase in these samples.…”
Section: Resultssupporting
confidence: 93%
“…Te, which is a common n-type dopant for GaAs [16], has been demonstrated to have interesting surfactant properties even at very low coverage. It has been reported to destroy step bunching in GaAs [17], reduce CuPt ordering in GaInP [18], and suppress three dimensional (3D) growth in InGaAs [19].…”
Section: Introductionmentioning
confidence: 99%
“…Opposed tendencies are reported in the literature. In [Sun91] is concluded that the surface morphology of heavily Te-doped GaAs is improved if the growth rate is decreased below 1.2 µm/hr, whereas in [Li95] growth rates as high as 6 µm/hr are reported to produce better surface morphologies. The origin of the surface degradation postulated in these works were the lattice expansion generated by the incorporation of Te in As sites [Houng86][Sun91], or the formation of a second phase for high Te mole fractions and low V/III ratios [Li95].…”
Section: Surface Morphology Of Heavily Te-doped Gaasmentioning
confidence: 99%