2015
DOI: 10.7567/jjap.54.04dp11
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Switching characteristics of a 4H-SiC insulated-gate bipolar transistor with interface defects up to the nonquasi-static regime

Abstract: The switching characteristics of a trench-type 4H-SiC insulated-gate bipolar transistor (IGBT) device with interface defects are analyzed up to the nonquasi-static (NQS) switching regime using reported interface density measurements and device simulation. Collector current degradation characterized by threshold voltage shift to higher gate voltages and reduction of current magnitude due to carrier trapping are observed under quasi-static (QS) simulation condition. At slow switching of the gate voltage, carrier… Show more

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Cited by 8 publications
(7 citation statements)
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“…2,23) The complete description of equations is given in Ref. 22 and summarized here. The defect densities are modeled as Gaussian and exponential distributions with model parameters extracted by fitting the distribution to the measurements.…”
Section: Modeling Of Defect Densities and Device Simulationmentioning
confidence: 99%
See 1 more Smart Citation
“…2,23) The complete description of equations is given in Ref. 22 and summarized here. The defect densities are modeled as Gaussian and exponential distributions with model parameters extracted by fitting the distribution to the measurements.…”
Section: Modeling Of Defect Densities and Device Simulationmentioning
confidence: 99%
“…21) The switching characteristics at high frequency has also been reported. 22) The delay of formation of carriers in the channel dominates more than the carrier trapping=detrapping when the switching speed reaches the nonquasi-static (NQS) regime. While different investigations are reported on the impact of defects, the effect on the device turn-off performance characteristics is not yet addressed.…”
Section: Introductionmentioning
confidence: 99%
“…The resulting I c -V c simulated with the measured trap density is shown in Fig.1b [3]. The switching characteristics at high-frequency has also been reported [4]. While different investigations are reported for the impact of defects, the effect on the device turn-off performance characteristics is not addressed.…”
Section: Introductionmentioning
confidence: 99%
“…For this reason, the expectation is focused on SiC as a next-generation power semiconductor. Because of a wide band gap of 3.26 eV, SiC-based power semiconductor devices can have advantages in the high voltage insulation strength and the robustness against high temperature [1][2][3]. In addition, SiC-based metal-oxide-semiconductor field-effect transistors (MOSFETs) have potential advantages in their low onresistance and high switching speed [4][5][6].…”
Section: Introductionmentioning
confidence: 99%