2005
DOI: 10.1016/j.surfcoat.2004.10.130
|View full text |Cite
|
Sign up to set email alerts
|

Surface characterization of CVD tungsten coating on molybdenum substrate

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
8
0

Year Published

2007
2007
2024
2024

Publication Types

Select...
10

Relationship

0
10

Authors

Journals

citations
Cited by 31 publications
(8 citation statements)
references
References 1 publication
0
8
0
Order By: Relevance
“…In the present research, molybdenum was used as a successfully interlayer, although it is a carbide former like W. The use of Mo as a substrate for W coatings was previously reported in the literature [15,16], but no one has used Mo as an interlayer for W coating on CFC. A beneficial role of Mo seems to be in connection with the adjustment of the thermal expansion mismatch between CFC and W (α W = 4-5⋅10 -6 K -1 ; α CFC = 10-12⋅10 -6 K -1 perpendicular to fiber and 0-1⋅10 -6 K -1 parallel to fiber plane; α Mo = 7.2⋅10 -6 K -1 ).…”
Section: Depositionmentioning
confidence: 90%
“…In the present research, molybdenum was used as a successfully interlayer, although it is a carbide former like W. The use of Mo as a substrate for W coatings was previously reported in the literature [15,16], but no one has used Mo as an interlayer for W coating on CFC. A beneficial role of Mo seems to be in connection with the adjustment of the thermal expansion mismatch between CFC and W (α W = 4-5⋅10 -6 K -1 ; α CFC = 10-12⋅10 -6 K -1 perpendicular to fiber and 0-1⋅10 -6 K -1 parallel to fiber plane; α Mo = 7.2⋅10 -6 K -1 ).…”
Section: Depositionmentioning
confidence: 90%
“…However, PS limit is represented by the inability to finely control film structure at the atomic scale, which often results in undesired material properties and failure of the coating [9,10]. Alternatively, in order to finely control film structure, morphology and stoichiometry, a variety of physical-(PVD) and chemical-(CVD) vapour deposition techniques is available for W coatings deposition [11,12,13,14]. Pulsed Laser Deposition (PLD) is one of the most versatile PVD techniques, by which both mono-or multi-elemental films such as metals, compounds and carbon based materials, also replicating complicated or unusual target stoichiometry can be deposited [15,16,17,18,19,20,21].…”
Section: Introductionmentioning
confidence: 99%
“…The investigated samples in the current work had the configuration of W on a Mo interlayer with different substrates. The use of the Mo interlayer as a substrate for W was previously reported in the literature, expressing it as an advantage [31]. Also, the Mo interlayer was applied as a buffer for the thermal expansion mismatch between the W layer and the low Z material substrate [31].…”
Section: Investigated Samplesmentioning
confidence: 99%