Structures, electrical and optical properties of nickel oxide films by radio frequency magnetron sputtering

Properties of nickel films growth by radio frequency magnetron sputtering at elevated substrate temperatures

“…In other reports, Rhee and Yang [6] and Maghazeii et al [7] studied the properties of Ni films deposited by electron beam evaporation. Furthermore, it was demonstrated that magnetron sputtering techniques i.e., direct-current (DC) magnetron sputtering and radio frequency (RF) magnetron sputtering could control over the sputtering conditions [8][9][10][11][12][13] and produce very high purity films owing to their clean environmentally friendly closed systems [14]. For instances, Yi et al [15] and Priyadarshini et al [16] reported on the structural, magnetic, and magnetoresistance properties, and morphology of Ni films deposited using DC magnetron sputtering.…”

Determination of certain sol-gel growth parameters of nickel oxide films

“…[13][14][15][16]. Among these, spin coating is more functional technique owing to its simplicity, safety, low cost and ability to deposit homogenous and good quality films [7,17].…”

Characterizations of nickel oxide thin films prepared by reactive radio frequency magnetron sputtering

“…It was clear that the electrical properties of NiO thin films are greatly affected by sputtering power, and the resistivity of the NiO thin films decreases with the increase of sputtering power. The films showed high electrical resistivity of 4.1 Ω·cm at sputtering power of 50 W. The electrical resistivity of the films decreased to 2.4 Ω·cm with increasing the sputtering power to 150 W. The electrical resistivity of NiO thin films has a strong dependence on the microstructural defects existing in NiO crystallites, such as nickel vacancies and interstitial defects [20].…”