Properties of nickel films growth by radio frequency magnetron sputtering at elevated substrate temperatures

Muslim, Noormariah; Soon, Ying Woan; Lim, Chee Ming; Voo, Nyuk Yoong

doi:10.1016/j.tsf.2016.05.049

Cited by 12 publications

(7 citation statements)

References 20 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…It implies that the grown films undergo structural relaxation at elevated temperatures via increment in dislocation densities and low crystallite size, which infers change in growth dynamics, as explained in the later part of the article. The obtained results are well justified as an increment in crystallite size with substrate temperature (till 300 C) has been reported previously, [24][25][26] suggesting favorable growth energetics in the temperature regime of %200À300 C. However, it is also noteworthy to mention that crystallite size calculated for the sample grown at 200 C, that is, 19.98 nm, was much higher in comparison with the reported values. [24] Interestingly, the obtained 2θ values indicated tensile stress, which is expected to be uniform as the peak value (i.e., 2θ) remained identical when XRD was conducted at different positions on the grown NiO films.…”

Section: Resultssupporting

confidence: 90%

“…The change in growth mechanism and perturbation in surface morphology associated with increment in substrate temperature was also observed previously by other researchers. [26,29,30] The mentioned argument and obtained results are well supported by XRD measurements as lower crystallite size at elevated temperatures (see Table 1) may assist in better and uniform coverage, leading to the generation of smooth surfaces.…”

Section: Resultssupporting

confidence: 70%

See 1 more Smart Citation

Temperature‐Driven Perturbations in Growth Kinetics, Structural and Optical Properties of NiO Thin Films

Mishra¹,

Barthwal²,

Tak³

et al. 2021

Physica Status Solidi (a)

View full text Add to dashboard Cite

Recent years have witnessed a growing demand in the improvement of nanostructured metal oxides with p-type conductivity. Nickel oxide (NiO) is a naturally grown p-type metal-oxide semiconductor pursuing direct wide bandgap (from 3.6 to 4 eV), moderate conductivity, good chemical stability, high transmittance, and excellent optoelectronic properties. [1] It crystallizes in sodium chloride (NaCl)-type face-centered cubic (FCC) structure and exhibits maximum hole conductivity along (111) direction. [1][2][3] Being a transparent p-type semiconducting oxide, NiO offers potential application in the domain of perovskite solar cells (transparent electrodes), visible blind photodetection, solid-state gas sensing and electrochromic displays, etc. [2][3][4][5] Despite its technological importance, the growth of device-grade NiO thin films has remained a challenging task, mainly attributed to its low conductivity. To date, numerous studies on the growth of NiO via various physical and chemical methods including magnetron sputtering, [6,7] plasma-enhanced chemical vapor deposition (PECVD), [8] pulsed laser deposition (PLD), [9] thermal evaporation, [10] spray pyrolysis, [11] sol-gel processing, [12] etc. have been reported so far. However, among the various aforementioned methods, radio-frequency (RF) magnetron sputtering is the most common and a widely used technique for the growth of NiO thin films. [13][14][15][16][17][18] Literature reports that growth parameters play a critical role in governing the properties of NiO films grown by RF magnetron sputtering. [13][14][15][16]19] Modifications in growth parameters may introduce various defects such as structural points defects, dislocations, or perturbation-induced ingap states, [13,15] affecting the structural, optical, and electrical properties of the grown NiO films. Ahmed et al. [16] observed that the growth of NiO is substrate dependent and that the inherent material properties depend strongly on the types of substrate (Si, GaAs, PET, etc). In contrast, Grilli et al. [19] reported that RF power and sputtering gas significantly influence the resistivity (from 10 À2 to 10 À1 Ω-cm) and transmittance of the grown NiO films. A recent study by Turgut et al. [20] said that oxygen partial pressure not only changes the structural and morphological properties, but it also influences the oxidation state of nickel, leading to significant variation in the performance of NiO-based hydrogen sensors. [20] In a recent report, Dhull et al. [21] also demonstrated that substrate temperature can play a significant role in tailoring the morphology of NiO films, leading to perturbation in charge transfer characteristics. However, few other studies were also conducted to explore the influence of growth temperature on structural, optical, morphological, and device applications of NiO thin films, but the extent of study was limited to a lower growth temperature, that is, up to 300 C only. [22][23][24][25] It implies that growth temperature significantly

show abstract

Section: Resultssupporting

confidence: 90%

Section: Resultssupporting

confidence: 70%

Temperature‐Driven Perturbations in Growth Kinetics, Structural and Optical Properties of NiO Thin Films

Mishra¹,

Barthwal²,

Tak³

et al. 2021

Physica Status Solidi (a)

View full text Add to dashboard Cite

show abstract

“…It is well known that microstructure, texture and structure of thin films can have significant influence on the magnetic and other functional properties of the films. The magnetic properties of evaporated [10–11], electrodeposited [12–15], chemical-vapor-deposited [16], and dc [17–19] and rf [20–22] magnetron sputtered thin nickel films have been studied for almost ten decades. This has included studies of the magnetic properties while varying film thickness [10,20], grain size, substrate material [11,21] and substrate temperature [19], as well as while stacking into superlattices [23–24].…”

Section: Introductionmentioning

confidence: 99%

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

Hajihoseini¹,

Kateb²,

Ingvarsson³

et al. 2019

Beilstein J. Nanotechnol.

View full text Add to dashboard Cite

Background: Oblique angle deposition is known for yielding the growth of columnar grains that are tilted in the direction of the deposition flux. Using this technique combined with high-power impulse magnetron sputtering (HiPIMS) can induce unique properties in ferromagnetic thin films. Earlier we have explored the properties of polycrystalline and epitaxially deposited permalloy thin films deposited under 35° tilt using HiPIMS and compared it with films deposited by dc magnetron sputtering (dcMS). The films prepared by HiPIMS present lower anisotropy and coercivity fields than films deposited with dcMS. For the epitaxial films dcMS deposition gives biaxial anisotropy while HiPIMS deposition gives a well-defined uniaxial anisotropy. Results: We report on the deposition of 50 nm polycrystalline nickel thin films by dcMS and HiPIMS while the tilt angle with respect to the substrate normal is varied from 0° to 70°. The HiPIMS-deposited films are always denser, with a smoother surface and are magnetically softer than the dcMS-deposited films under the same deposition conditions. The obliquely deposited HiPIMS films are significantly more uniform in terms of thickness. Cross-sectional SEM images reveal that the dcMS-deposited film under 70° tilt angle consists of well-defined inclined nanocolumnar grains while grains of HiPIMS-deposited films are smaller and less tilted. Both deposition methods result in in-plane isotropic magnetic behavior at small tilt angles while larger tilt angles result in uniaxial magnetic anisotropy. The transition tilt angle varies with deposition method and is measured around 35° for dcMS and 60° for HiPIMS. Conclusion: Due to the high discharge current and high ionized flux fraction, the HiPIMS process can suppress the inclined columnar growth induced by oblique angle deposition. Thus, the ferromagnetic thin films obliquely deposited by HiPIMS deposition exhibit different magnetic properties than dcMS-deposited films. The results demonstrate the potential of the HiPIMS process to tailor the material properties for some important technological applications in addition to the ability to fill high aspect ratio trenches and coating on cutting tools with complex geometries.

show abstract

“…In literatures researchers had focussed on magnetic property due to its ferromagnetic nature by using sputtering techniques. For instances, Yi et al [11], Muslim et al [12], Priyadarshini et al [13], Hajihoseini et al [14] and Kacel et al [15] reported on the structural, magnetic, and magnetoresistance properties, and morphology of Ni films deposited using DC magnetron sputtering. While nickel thin films have found diverse applications in the scientific literature, our research distinctly delves into their deployment as neutral density filters (NDF), capitalizing on their exceptional optical properties.…”

Section: Introductionmentioning

confidence: 99%

Thickness-related variation in the structure, morphology and optical characteristics of nickel thin films for neutral density filtering

Yadav,

Shankar

et al. 2024

Phys. Scr.

View full text Add to dashboard Cite

In this paper we fabricate neutral density filter (NDF) for the visible region on the Borosilicate glass substrate at room tempreature. E-Beam coating unit is used for fabrication of Nickel thin film on the Borosilicate glass substrate under high vacuum. XRD measurement examined the amorphous growth of thin film at low thickness (t =10 nm) while higher thickness supported crystalline growth. The Crystallite size (D) and lattice strain (ϵ) is decreasing with increasing the thickness. Microstructural investigation by atomic force microscope (AFM) revealed that surface roughness is decreasing with increasing of thickness i.e. From 0.018 to 0.008 nm. The decreasing of roughness prevents scattering loss in neutral density filter. Optical transmittance spectra are obtained using UV-Visible spectrophotometer. Nickel 70 nm thickness is an optimum thickness to achieve high optical density (OD = 2.5) but neutrality is poor for higher thickness of filter. Hence the spectral variation of thin filters in our case 10nm has least spectral variation (ΔOD= 0.11) for stable and durable NDF.

show abstract

Properties of nickel films growth by radio frequency magnetron sputtering at elevated substrate temperatures

Cited by 12 publications

References 20 publications

Temperature‐Driven Perturbations in Growth Kinetics, Structural and Optical Properties of NiO Thin Films

Temperature‐Driven Perturbations in Growth Kinetics, Structural and Optical Properties of NiO Thin Films

Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering

Thickness-related variation in the structure, morphology and optical characteristics of nickel thin films for neutral density filtering

Contact Info

Product

Resources

About