“…Various physical and wet deposition techniques have been used to grow NiO in thin film forms. These techniques are RF magnetron sputtering,metal-organic chemical vapour deposition (MOCVD), sol–gel, thermal decomposition and pulsed laser deposition (PLD) [5,8,10,12,15,16]. Also, NiO films were synthesised by electrochemical precipitation method [17], chemical-vapour deposition (MOCVD) [12,18] and PLD [19].…”