Abstract:NiO films were deposited on glass and Si(100) substrates by reactive pulsed laser deposition from the Ni target. Nd: YAG laser (1064 nm) was used. The oxygen pressure was between 0.05 and 0.3 Torr. The optimum conditions for a good-quality NiO film are an oxygen pressure of 0.1 Torr and a laser power of 410 mW. Preferred orientation changes from (200) to (220) and D decreases from 27 to ∼9 nm as the temperature increases from 200 to 300°C. The preferred orientation changes into (111), nanoparticles size reduce… Show more
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